Compact, low-cost, and feature-rich, low-cost sputtering equipment for research and development. Sample testing and facility tours available.
Realization of the capabilities of a higher-end model capable of small-scale production using a manually operated simple experimental machine. An 8-inch compatible multi-frequency RF sputtering device. Supports fundamental research in MEMS, compound semiconductors, and electronic devices due to high-speed exhaust and excellent process performance. A series of batch-type sputtering devices with a proven track record in mass production of electronic components.
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basic information
Standard specifications Multi-layer film formation using a 4-inch cathode with three elements High-speed exhaust with a turbo molecular pump and an oil rotary pump Achieving high film quality with standard features of reverse sputtering and substrate heating mechanism Realizing multifunctionality in a compact housing of 1 m² Compatible with units from higher-end models
Price information
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Delivery Time
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Applications/Examples of results
Research and development applications by universities and research institutions Biosensors, electrodes, insulation film formation Resistors, electrodes, insulation films, thin film resistor creation Formation of insulation films for various elements
Line up（1）
| Model number | overview |
|---|---|
| SRV3100 Type | The simplest experimental small sputtering device for cathode 1, small and compact, low cost, standard model for basic experiments |
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Company information
Shinko Seiki, as a technology-driven manufacturer, leverages the numerous know-how accumulated particularly in the field of vacuum equipment to deliver innovative products that meet user needs. In recent years, the company has also been challenging cutting-edge fields such as electronics and new materials, aiming to develop truly valuable hardware and software through the advancement of distinctive technologies and their organic integration.
