Solved the conventional issues! Significantly improved the film formation speed while maintaining low damage characteristics.
In conventional planar sputtering, significant damage was inflicted on the substrate, and in opposing sputtering, the film deposition rate was slow, posing practical challenges. Our "RAM Cathode" successfully generates dense plasma near the target surface by surrounding the target on all sides. By having argon ions collide with great force against the target, we have resolved the issues that existed until now. 【Features】 ■ Reduces damage to the substrate by over 60% compared to conventional planar cathodes ■ Achieves a film deposition rate more than three times that of conventional opposing cathodes *For more details, please refer to the PDF document or feel free to contact us.
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Keihin Ramtech was founded in 1972 and has become a trusted manufacturer in the liquid crystal and semiconductor manufacturing equipment industry as well as the automotive industry. At our company, we believe that continuous technological development is the responsibility of all employees. The unique technology possessed by Keihin Ramtech is utilized as core technology across various industries. As a proposer that continues to develop and propose innovative technologies expected to further advance in the future, we contribute to our customers' continued growth.