It is a cermet thermal spray material that excels in corrosion resistance and wear resistance, particularly in slurry erosion resistance.
This is a thermal spray material made of WC/20wt%CrC/7wt%Ni produced by the granulation and sintering method. By strictly managing particle size and granule strength, it achieves spitting prevention and excellent adhesion efficiency, resulting in a thermal spray coating that is resistant to corrosion and has outstanding wear resistance. W2007 has excellent wear resistance and wet abrasion resistance (slurry erosion resistance). Additionally, it has superior oxidation resistance compared to other WC cermets. However, its toughness is lower than that of other cermet materials, so caution is needed when used in environments subjected to mechanical impact. [Application Examples] Leveraging its high corrosion resistance and wear resistance, it is used in chemical plant components and other applications. Application examples: - Petrochemical plant components - Film rolls - Paper-making rolls - Steel plate transport rolls - Calendar rolls - Pump components, etc. [Message] At Fujimi, we manufacture and sell many cermet materials in addition to W2007, and we can also prototype powders with adjusted WC particle size and composition according to customer requests. If you have any questions or requests regarding cermet materials, please feel free to contact us. *For more details about the products, please refer to the catalog.
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*For more details, please refer to the catalog.*
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【Examples of Use】 Utilizing high corrosion resistance and wear resistance, it is used in components for chemical plants, among others. Application examples: - Petrochemical plant components - Film rolls - Paper-making rolls - Steel plate transport rolls - Calendar rolls - Pump components, etc.
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Fujimi Incorporated has been a pioneer in the precision artificial abrasive materials industry since its founding in 1950, continuing its unique journey by leveraging classification technology and other advancements. The products born from accumulated know-how and research and development capabilities have evolved from polishing materials for optical lenses to essential components in advanced industries requiring high precision, such as mirror polishing of semiconductor substrates represented by silicon wafers, CMP (Chemical Mechanical Planarization) necessary for multilayer wiring of semiconductor chips, and polishing of hard disks for computers. Recently, we have also been actively engaged in the development of polishing and grinding materials for surface processing in fields such as LED, displays, and power electronics, as well as in applied areas utilizing powder technology. Additionally, we provide thermal spray materials for various industries, including steel, aerospace, and semiconductors.
