Patented new technology: Microplasma processing technology capable of high-speed local processing.

[Free Comparative Data] Achieve efficiency in deep flat processing and localized processing! We also introduce localized plasma processing equipment utilizing localized plasma technology!

Sanyou Manufacturing has successfully developed a new microplasma processing technology. The microplasma processing developed by our company features a high plasma density while maintaining a small plasma diameter, enabling both high-speed processing and maskless localized processing through spot plasma technology. Localized plasma allows for deep trench flat processing and localized processing, significantly reducing the pretreatment time for semiconductor failure analysis samples! In the localized plasma processing equipment utilizing this technology, reaction byproducts can be directly exhausted, allowing for a reduction in processing residues, and furthermore, localized processing can be performed without spraying process gases onto the substrate surface. [Presentation Materials] ■ Comparison materials for plasma sources (Introduction to spot plasma) ■ Introduction materials for localized plasma processing equipment *For more details, please refer to the PDF materials or feel free to contact us. *For details on patents, please also refer to the PDF materials.

Plasma Generator