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  6. High thermal conductivity, high electrical insulation 'aluminum nitride (AlN)'

High thermal conductivity, high electrical insulation 'aluminum nitride (AlN)'

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last updated:Apr 16, 2024

清水商会
清水商会
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Aluminum nitride, with its high thermal conductivity and high electrical insulation properties, is attracting attention as a material for high thermal conductivity substrates and is also expected to be used in next-generation power semiconductors.

Aluminum nitride is a nitride of aluminum and is a material with very high thermal conductivity (approximately 170 W/(m·K), which is about 5-8 times higher than alumina). It is used in heat dissipation components and thermal uniformity components. It is also characterized by its high electrical insulation compared to other ceramics. Mirror finishing is also possible. <Features> - High thermal conductivity and thermal emissivity, with excellent thermal uniformity - Strong against thermal shock, capable of withstanding rapid heating and cooling - Low thermal expansion matched to silicon, preventing wafer deformation due to temperature changes and reducing particle generation caused by film peeling - High corrosion resistance to fluorine-based gases - Excellent plasma resistance *For more details, please refer to the catalog or website, or feel free to contact us.

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High thermal conductivity, high electrical insulation 'aluminum nitride (AlN)'

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  • Related Link - https://www.ceramics-shimizu.co.jp/aluminum/

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basic information

The standard dimensions for handling are as follows. Please use these dimensions as a reference for your design. <Standard Thickness Dimensions> 5mm, 10mm, 15mm, 20mm, 4mm <Standard Outer Diameter Dimensions> 210×210 (For thickness 4mm only, 300×300)

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<Applications> Parts for plasma etchers Parts for wafer chucks Wafer holding jigs for steppers Dummy wafers Heater uniform heating plates Evaporation crucibles

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Metallization on ceramics, thick film printing, thin film printing, ceramic processing.

Metallization on ceramics, thick film printing, thin film printing, ceramic processing.

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清水商会

清水商会

Ceramics

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We respond to all requests with the most suitable methods, including electrode formation by metallization, ceramic sintering, polishing, lapping, pressing, and extrusion. We specialize in materials such as alumina, zirconia, macor, Shapal Hi M soft, aluminum nitride, BN, SiC, silicon nitride, quartz, tungsten, molybdenum, tantalum, and carbon, specifically for semiconductor manufacturing equipment. We cater to all needs, from short lead-time prototypes to mass production starting from one piece.

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