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This is a compact high-power plasma source that can be used with the ICF70 mount. The plasma source features a simple design, and the controller, which is resistant to abnormal discharges and pulse shocks, has been cleverly designed with a wide output band, achieving ease of maintenance for users and high cost performance.
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basic information
Specifications Beam Energy: 230 eV ~ 430 eV Beam Current: 10 mA or more Current Density: 2.25 mA/cm² *Measurement conditions above: WD = 50 mm (250 eV) Beam Shape: Broad Gaussian Emission Current: Maximum 400 mA Operating Vacuum: Approximately 2.2E-2 Pa ~ 7.4E-1 Pa (when using TMP 800 L/s) Operating Gas: Argon (Nitrogen is also possible, but data will vary) Gas Inlet: VCR 1/4” Female Nut Discharge Electrode Material: Mo (Standard Specification) Connection Cable: 5 m Controller Specifications OMI-0001PS Anode Voltage Current: Variable (Analog type) Meter: Voltage value, Current value (Analog type) Size: 19-inch Rack Size Power Supply: AC 100V 5A Product Page http://www.omegatron.co.jp/product/996.html Topics http://www.omegatron.co.jp/topics/998.html
Price information
Usually 1.2 million yen (excluding tax) for direct sales only.
Price range
P5
Delivery Time
Applications/Examples of results
Etching plasma irradiation
Detailed information
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Argon plasma
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Nitrogen plasma
Company information
Our company's sales policy is based on the following three pillars: - Contributing to the realization of researchers' "dreams" and "thoughts" through assistance in advanced and unique fundamental research. - Providing and maintaining high-performance vacuum experimental equipment, primarily consisting of high-performance electron guns and high-performance ion guns, tailored to meet our customers' needs, thereby contributing to research and development. - Applying these fundamental technologies to develop original products from OmegaTron, contributing to a wide range of industries and research and development sectors.
