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  6. Film formation processing on resin film

Film formation processing on resin film

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last updated:Apr 06, 2022

東邦化研
東邦化研
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Film formation at low temperatures is possible! Film formation can be done on resin films such as polyimide, polycarbonate, acrylic, and PET.

Toho Kaken Co., Ltd. offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. We have established a system to respond to a wide range of requests, from small-scale projects such as prototypes, development, and research to medium-lot production projects, accommodating various types of films including metal films, reactive films such as oxide, carbide, and nitride films, alloy films, and their laminated films. With a rich lineup of equipment from small to large-scale and over 35 years of proven experience, we flexibly meet our customers' needs! For substrates with low heat resistance, such as polyimide, polycarbonate, polyethylene, PET, and COP films, please feel free to consult us about film formation! Depending on the type and thickness of the film, we can perform film formation at temperatures below 100°C! In addition to resin films, we can also apply films to resin molded products!

    Processing ContractSurface treatment contract serviceplastic
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Film formation processing on resin film

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  • Related Link - http://www.tohokaken.jp/index.htm

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■Supported Film Types Metal Films: Al, Au, Ag, Cu, Ni, Cr, Mg, B, Ti, Zr, Nb, Mo, Pd, In, Si, Ta, W, Sn, Pt, etc. Stacked Films: Au/Ni/Cr, Au/Pt/Ti, Au/Pd/Ti, Au/Cr, Cu/Cr, etc. Oxide Films: Al2O3, SiO2, TiO2, Cr2O3, ITO, MgO, NbO, Ta2O5, WO3, ZrO2, ZnO, etc. Nitride Films: AlN, BN, CrN, MoN, NbN, SiN, TaN, TiN, etc. Carbide Films: SiC, TiC, BC, etc. ■Maximum Usable Size: 800×1000mm *We have a wide range of equipment from small to large. ■Supported Substrates - Si Wafer - Glass - Film - Ceramics - Metal Materials - Others

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Toho Kaken Co., Ltd. Catalog with Processing Results

Toho Kaken Co., Ltd. Catalog with Processing Results

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Very easy to understand 'Thin Film Q&A'

Very easy to understand 'Thin Film Q&A'

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Technical Documentation on Surface Treatment Thin Film Coating

Technical Documentation on Surface Treatment Thin Film Coating

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Ion plating method

Ion plating method

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Sputtering method

Sputtering method

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Plasma CVD method

Plasma CVD method

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Company information

東邦化研

東邦化研

Electronic Components and Semiconductors

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Our company offers contract processing (coating services) for functional thin films using ion plating, vacuum deposition, sputtering, and plasma CVD. Since our inception, we have focused on "functional thin films" such as conductivity, insulation, and corrosion resistance. We accommodate various types of films, including metal films, reactive films like oxide, carbide, and nitride films, as well as their laminated films. We have established a system to respond to a wide range of requests, from small-scale prototypes, development, and research to medium-sized production runs. Currently, we have 11 deposition devices in operation, ranging from small machines with a diameter of 300mm to inline mass production machines with a film formation area of 1000mm x 900mm. All processes, from the unboxing of substrates entrusted by customers to the packaging of the coated products, are conducted within a clean room. If you are considering functional thin films, please feel free to contact us! Based on our flexible response and over 35 years of experience, we will meet your needs! *Information about our exhibition participation is also available on our website. Please take a look.

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