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  4. Semiconductor Manufacturing Equipment
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  6. 150mm compatible exposure device

150mm compatible exposure device

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last updated:Jun 27, 2023

大日本科研
大日本科研
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Fully automatic exposure device (mask aligner) compatible with Ø2” to 6”

【Main Features】 - All functions are compactly integrated. - Equipped with a unique alignment system. - Operator assistance and production management using a barcode reader. - Compatible with higher-level communication systems. - Over 500 units sold for mass production.

    Other semiconductor manufacturing equipment
MA-4000SP実写画像.jpg

150mm compatible exposure device

MA-4000SP実写画像.jpg
MA-4000SP実写画像.jpg
  • Related Link - https://www.kakenjse.co.jp/products/compound/

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basic information

【Main Specifications】 - Size: Ø2 to Ø6” - Mask Size: □4 to □7” 【Compatible Substrates】 - Silicon, Ceramic, Sapphire, Glass, Quartz, etc. *We accept inquiries for various customizations.

Price range

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Delivery Time

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Applications/Examples of results

LED, inductor, resistor, sensor, various types of diodes. Please feel free to consult us for anything else.

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MA-4200

MA-4200

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大日本科研

大日本科研

Optical Instruments

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Since our founding, we have utilized and passed down the skills of artisans while establishing cutting-edge technology. With "quality first" and "customer priority" as our guiding principles, we strive to create products that bring joy to our customers, and thanks to the exceptional guidance and support from many, we have steadily grown to this day. We possess unique technologies in optics, precision mechanisms, electronic control, and software, and we are committed to improving our technical capabilities, particularly in exposure equipment, which is a combination of optomechatronics technologies. Additionally, we have obtained ISO 9001 and KES certifications as part of our commitment to quality and environmental management. Moving forward, we will continue to focus on creating equipment that can respond to our customers' needs in a timely manner, with an emphasis on "high quality," "short delivery times," and "low costs."

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