It has minimal impact on resin materials, excellent quick-drying effects, and the device itself is space-saving.
We would like to introduce the "Fluorine-based Cleaning System Particle Removal System" handled by Shin Ootsuka. This product utilizes fluorine-based solvents, taking advantage of low surface tension and permeability to thoroughly penetrate the product and remove particles. It has minimal impact on resin materials, excellent quick-drying effects, and the equipment itself is space-saving. It can also be used for drying applications after alcohol (IPA, ethanol). 【Features】 <Compact F Series (Type F-110)> ■ Suitable for prototype testing and laboratory use ■ Compatible with various fluorine-based solvents ■ Compact design (portable) ■ Capable of ultrasonic cleaning and steam cleaning ■ Liquid recycling (distillation regeneration) is possible *For more details, please refer to the related link page or feel free to contact us.
Inquire About This Product
basic information
【Applicable Fields (Partial)】 ■ C-MOS Sensors ■ Optical Lenses ■ Optical Fibers ■ LCD Components ■ Quartz Crystals ■ Magnetic Heads ■ HDD Components ■ Relay Components ■ Resin Parts Before Coating, etc. *For more details, please refer to the related links page or feel free to contact us.
Price range
Delivery Time
Applications/Examples of results
For more details, please refer to the related link page or feel free to contact us.
catalog（1）
Download All Catalogs
Company information
Shin Otsuka Co., Ltd. aims to achieve higher cleaning performance and lower costs while minimizing the environmental impact on the Earth from the perspective of environmental protection as a comprehensive manufacturer of precision cleaning equipment. We will continue to deliver systems that meet your needs, including a fluorinated solvent-compatible cleaning system equipped with a unique cleaning agent recycling mechanism, ultrapure water cleaning systems, and hydrocarbon-based cleaning systems.
