High-power single-frequency semiconductor laser 'TopWave 405'

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The TopWave 405 is an ideal laser system to replace the traditionally used high-power Kr+ gas lasers (406.7 nm and 413.1 nm) in holographic lithography applications. The TopWave 405 achieves 1 W output at 405 nm with excellent beam quality. The beam diameter and M² (typ. 1.15) are designed to match the parameters of existing gas lasers, allowing for easy integration into conventional systems without significant changes to the optical setup. Additionally, with a coherence length of over 100 m, it enables stable pattern generation in interference lithography and holography. Gas lasers require several kilowatts of power and cumbersome water-cooled chillers, but the TopWave 405, which adopts an "all-semiconductor laser" approach, operates with low power consumption of under 100 W and does not require a water-cooled chiller. This significantly reduces operating costs and greatly contributes to improving ownership costs. Furthermore, the use of long-lasting semiconductor lasers extends maintenance cycles, providing the benefit of dramatically reducing refurbishment costs.

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Manufacturing of diffraction devices for exposure and for AR/VR use.