A research membrane environment that aims to eliminate oxygen and moisture! Supports multilayer membranes, compound membranes, and reactive membranes!
This product is a sputtering device for the development of batteries, catalyst materials, and organic devices. It connects a load lock chamber and a glove box to the sputtering chamber. It can accommodate four UHV-compatible sputter cathodes. Additionally, it supports multilayer films, compound film deposition, and reactive film deposition. 【Features】 ■ For the development of batteries, catalyst materials, and organic devices ■ Connects a load lock chamber and a glove box to the sputtering chamber ■ Can accommodate four UHV-compatible sputter cathodes ■ Research film deposition environment that eliminates oxygen and moisture ■ Supports multilayer films, compound film deposition, and reactive film deposition *For more details, please refer to the PDF document or feel free to contact us.
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【Specifications (Partial)】 ■ Sputter Cathode - Compatible with ultra-high vacuum - Low damage film deposition - Up to 4 sources can be installed ■ Substrate Holder - Substrate heating mechanism (normal use 800°C, compatible with oxidizing atmosphere) - Substrate rotation mechanism (motor rotation) - Substrate lifting mechanism (stroke 50mm) - Substrate bias application mechanism *Optional *For more details, please refer to the PDF document or feel free to contact us.
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For more details, please refer to the PDF document or feel free to contact us.
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