Charge-up evaluation is possible for dry etching, plasma CVD, sputtering, and ion implantation.
Our company supports customers' technology development with semiconductor technology for test wafers. We provide services for test wafers, including bare Si wafers, film-coated wafers, and patterned wafers. Our services for evaluating charge-up damage are available even for 12-inch wafers and have been globally recognized for a long time. We can evaluate charge-up using dry etching, plasma CVD, sputtering, and ion implantation, with wafer sizes accommodating 300mm, 200mm, and chip measurements. We measure wafers that have undergone plasma treatment on the customer's equipment and provide data for I/V curves and Vbd maps. Additionally, TDDB (Qbd) measurement services are also available. *For more details, please download the PDF or feel free to contact us.
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Our company has been continuously supporting our customers' technology and product development with advanced semiconductor technology using test wafers for over 20 years. Our know-how and experience have transcended the boundaries of semiconductor manufacturing and culminated in the development of the gas instant heating component, the "Heat Beam Cylinder." This technology is expanding its application not only in the semiconductor field but also across various industrial sectors, demonstrating its achievements and effectiveness. If you have any technical inquiries or product requests, please feel free to contact us at any time.