Low-cost, low-temperature, and simple manufacturing processes
γ-Gallium oxide (γ-Ga2O3) is one of the metastable structures of gallium oxide and has excellent catalytic properties. However, it was difficult to be synthesized. In the conventional method for producing γ-Ga2O3, gallium nitrate hydrate was dissolved in distilled water with urea and baked at 500ºC. However, this method required a facility for high-temperature treatment and had a problem of increasing production costs such as equipment costs. The present invention makes it possible to provide a method for producing gallium oxide at a low temperature and a simple process, thereby reducing production costs. It is characterized in that a raw material solution containing liquid gallium and a reducing agent is irradiated with ultrasonic waves. Thus, particles of gallium can be refined, and particles having crystals of γ-Ga2O3 can be formed on the surface thereof. As a result, the baking process and the complicated separation and cleaning process are not required, the manufacturing cost is reduced, and γ-Ga2O3 can be produced by a simple process at a low temperature.
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The revenue generated from technology transfer is reinvested into universities and researchers as new research funding, which is used to create further research outcomes. To ensure the smooth operation of this cycle, known as the "Intellectual Creation Cycle," we will actively promote technology transfer. The types of seeds we handle include patents, know-how, databases, and programs. We have established a collaborative framework by concluding basic technology transfer agreements with the following universities (as of April 1, 2026): - Tohoku University - Hirosaki University - Iwate University - Akita University - Fukushima University - Yamagata University - Tohoku Gakuin University - Iwate Medical University - Fukushima Medical University - Aizu University - Miyagi University - Hokkaido University - Muroran Institute of Technology - Showa Medical University - Asahikawa Medical University
