Qualitative and quantitative evaluation of metallic impurities in non-alkali glass.
TOF-SIMS, D-SIMS: Secondary Ion Mass Spectrometry
In semiconductor manufacturing processes, the contamination of impurities can lead to a decrease in characteristics and manufacturing yield, making the prompt identification and quantification of impurity elements crucial. At MST, we qualitatively analyze impurity elements using TOF-SIMS (Static-SIMS) and quantitatively measure the detected elements in the depth direction using D-SIMS (Dynamic-SIMS), enabling the evaluation of impurities within devices. This document presents a case study of measuring metal impurities in alkali-free glass.
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It is an analytical method used for oxide semiconductors, LSI/memory, electronic components, and manufacturing equipment/parts.
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MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!