Flow, pressure, steam, and vacuum products "Comprehensive Catalog" *Includes flow meters and more!

"Maximizing the Best Performance" This is the industry's first fully pressure-insensitive type of pressure-based mass flow controller (P-MFC) specifically designed for advanced etching and deposition processes in semiconductor manufacturing. The GP200 series P-MFC adopts a patented architecture that overcomes the limitations of conventional P-MFCs, enabling high-precision process gas supply even with low vapor pressure process gases. It also features a built-in differential pressure sensor and a unique design that places the valve downstream, allowing for high-precision process gas supply across the widest range of operating conditions in the industry. Due to its compatibility with a wide range of process conditions, it can be used as a replacement or upgrade for conventional P-MFCs and thermal MFCs. Additionally, by eliminating the need for components such as pressure regulators and converters, it simplifies the gas supply system and reduces costs. [Main Applications] ■ Semiconductor Manufacturing ■ Etching ■ CVD ■ Gas flow control applications requiring high-purity all-metal flow paths

Realizing Precision Control in Energy Innovation Hydrogen, fuel cells, CCUS, biofuels, CNT manufacturing. There are technologies on-site that monitor precise flows to support the energy of the future. Brooks Instrument's flow meters support the energy transition.