Shape observation and simple quantitative analysis using SEM-EDX.
Control of particles in the semiconductor wafer manufacturing process is extremely important for ensuring wafer quality. In this case study, we estimated what the particles were on a Si wafer through SEM observation, EDX analysis, and simple quantification. The SEM equipment, which has high spatial resolution in the submicron range and can scan areas of several centimeters, allows for rapid inference of what the particles on the wafer are based on shape and composition information, enabling quick identification of the generation process. Analysis linked to coordinate data from defect inspection equipment is also possible.
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basic information
Measurement and processing method: [SEM-EDX] Energy Dispersive X-ray Spectroscopy (SEM) Product fields: LSI, memory, manufacturing equipment, and components Analysis purpose: Composition evaluation and identification, shape evaluation
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Applications/Examples of results
Analysis of LSI memory, manufacturing equipment, and components.
catalog（1）
Download All Catalogs![[Analysis Case] Composition Analysis of Particles on Wafer_C0736](https://image.mono.ipros.com/public/catalog/image/387108/IPROS8493626015609635351.jpeg?w=120&h=170)
Company information
MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!
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