Capture nano-level crystal defects at a macro scale to improve the accuracy of quality control.
In the semiconductor industry, the detection of fine defects on wafer surfaces is a crucial factor that influences product reliability. Nano-level irregularities and scratches, which are often overlooked in visual or microscopic inspections, can lead to reduced yield and product defects. This unit captures these fine defects over a wide area using off-axis optical systems and edge reflection light detection, contributing to the efficiency of the inspection process and improving the accuracy of quality control. 【Usage Scenarios】 - Quality inspection of wafer surfaces - Early detection of abnormalities in the manufacturing process - Inspection tasks in quality control departments 【Benefits of Implementation】 - Reduction in inspection time - Decrease in defective products - Reduction in quality control costs
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【Features】 - Visualization of minute changes in the nanometer range - High-sensitivity detection using off-axis optical systems and edge reflection light detection - Comprehensive understanding of a wide range of surface conditions through macro imaging - Compatible with various wafers such as Si, SiC, and GaN - Rapid detection of defects across the entire wafer that may be overlooked in visual or microscopic inspections 【Our Strengths】 We specialize in macro optical inspection and provide optimal inspection solutions tailored to our customers' needs. We support the efficiency of inspection processes and the improvement of quality.
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Smix Corporation is a company specializing in the development, manufacturing, and sales of devices for macro optical inspection. We can perform macro inspections that have a high correlation with CD, capture size variations of 3nm on a macro scale, and visualize the unevenness of mirror-like wafers. By implementing our macro inspection, customers can establish a more efficient and cost-competitive inspection process. Trust us with your macro optical inspection needs.
