[Analysis Case] Analysis of Surface Functional Groups of Polymer Materials 3 (Chemical Modification - XPS)

This paper presents a case where specific functional groups were chemically modified, and the presence and ratio of C=C were evaluated from the introduced marker elements.

X-ray photoelectron spectroscopy (XPS) is used to understand the chemical bonding states of elements on the surface of polymer materials, but it is difficult to distinguish between C=C, C-C, and C-H chemical bonds. Therefore, we introduce a case where C=C was chemically modified with osmium tetroxide (OsO4), and the presence and quantity ratio of C=C were evaluated from the introduced marker element (Os). 【Analysis Samples】 (1) Polybutadiene thin film (2) Two types of styrene-butadiene rubber with different monomer mixing ratios 【Analysis Method】 The surfaces of each sample were subjected to chemical modification treatment using OsO4 before XPS measurement. XPS: Monochromatic Al Kα radiation (manufactured by ULVAC-PHI, PHI5000 VersaProbe II) By combining the chemical modification treatment using OsO4 with XPS analysis, it is possible to evaluate the presence and quantity ratio of C=C not only on the resin surface but also in surface modification layers, coating layers, and adhesive layers, making it effective for material performance evaluation. Additionally, evaluating the amount of C=C is also effective as an indicator of the degree of resin degradation, allowing for the assessment of material degradation by comparing the C=C amount with that of new materials.

Contract measurement