A cleaning unit that achieves submicron level particle removal.
In the photomask industry, the removal of fine particles during the manufacturing process is a critical challenge that affects product quality and yield. In particular, the cleaning of wafers and photomasks requires the removal of submicron-level contaminants. Inadequate cleaning can lead to decreased device performance and the occurrence of defective products. Our cleaning unit, the "Proximity Megasonic PA10-Q60AE-S," enables cleaning close to the substrate and addresses these challenges by removing submicron particles. [Usage Scenarios] - Cleaning of silicon wafers - Cleaning of photomasks - Cleaning after CMP - Batch cleaning [Benefits of Implementation] - Improved yield due to high cleaning performance - Enhanced product quality - Reduced cleaning time
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basic information
【Features】 - The nozzle material is quartz, which results in low dust generation and durability against chemical solutions. - Ultrasound at 1.0MHz or 3.0MHz is emitted from the nozzle tip. - It enables high linearity oscillation from a low output range. - Cleaning is performed close to the substrate, allowing for the removal of submicron particles. - Liquid supply with a function to prevent dry firing is possible. - It can perform a sweeping motion on the substrate, achieving highly reproducible cleaning across the entire substrate. - Equipped with various oscillation modes, allowing for adjustments suited to the substrate process. 【Our Strengths】 We develop, design, manufacture, and sell various devices tailored to the needs of customers in the semiconductor industry, including their applications and manufacturing lines. We specialize in customized production based on customer specifications and provide total support for the product lifecycle, from design, development, assembly, inspection, installation, to maintenance.
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Applications/Examples of results
【Usage】 ■ Cleaning of silicon wafers, photomasks, LCD glass, magnetic disks, etc., cleaning after CMP, batch-type cleaning *For more details, please download the PDF or feel free to contact us.
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Company information
Our company develops, designs, manufactures, and sells various equipment tailored to customer applications and manufacturing lines in the semiconductor, photomask, disk, and lens industries. We specialize in customized production based on customer specifications, providing total support for the product lifecycle from design, development, assembly, inspection, installation, to maintenance. By building close relationships with customers at every stage, we can directly sense the issues and technological trends they perceive, allowing us to quickly initiate development in response.
