Spin cleaning unit for corner substrates and photomasks

Compatible with square substrates such as photomask substrates. Achieves integrated processing within the same unit, from cleaning solution supply from both the top and bottom sides to drying through high-speed rotation.

This product is a spin cleaning unit designed to efficiently clean and dry square-shaped substrates (square substrates), including photomask substrates. ■ Cleaning process specialized for square substrates It provides stable spin cleaning for square substrates, which are generally considered difficult to process with rotation. It is primarily designed for photomask substrates of size 152×152mm, but it can accommodate various sizes of square substrates. ■ Complete process from cleaning to drying in one unit The drying process, using high-speed rotation, is performed within the same unit following the cleaning process. This allows for the completion of the entire series of processes without moving the substrate, contributing not only to a reduction in takt time but also to a decrease in the risk of recontamination during movement, thereby maintaining high cleaning quality. *For more details, please download the catalog or feel free to contact us.

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