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  6. GP200 Series for Semiconductor Film Deposition

GP200 Series for Semiconductor Film Deposition

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last updated:May 08, 2026

ITWジャパン
ITWジャパン
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Achieving stabilization of the film formation process and improvement of yield with pressure-based MFC.

In the film deposition process of semiconductor manufacturing, even slight variations in gas flow can have a significant impact on film thickness and quality. Particularly in CVD, PVD, and ALD processes, high-precision and highly reproducible flow control is a crucial factor that influences device performance and yield. The GP200 series achieves high-precision flow measurement and excellent reproducibility through differential pressure sensors and optimized control valve design. It supports stable process control and contributes to the formation of high-quality thin films. 【Application Scenarios】 - CVD (Chemical Vapor Deposition) process - PVD (Physical Vapor Deposition) process - ALD (Atomic Layer Deposition) process 【Benefits of Implementation】 - Improved film thickness uniformity - Enhanced composition control accuracy - Yield improvement through process stabilization - Increased reproducibility of gas supply

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GP200 Series for Semiconductor Film Deposition

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  • Related Link - https://www.brooksinstrument.com/ja/product/gp200-…
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【Features】 - Reduction of measurement errors by adopting differential pressure sensors - Achieving stable flow control under a wide range of process conditions - High-precision and high-response mass flow control performance - Reducing valve leakage to 1/100 of conventional levels - Meeting the high stability and reproducibility required in semiconductor manufacturing processes 【Our Strengths】 We provide solutions for semiconductor manufacturing processes based on the technology and achievements we have cultivated over many years in the field of precision fluid measurement and control. We propose the optimal mass flow controllers tailored to our customers' process conditions and specifications, ensuring stable operation and increased productivity. Please feel free to consult us with your requests.

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Pressure-based gas mass flow controller "GP200 series"

Pressure-based gas mass flow controller "GP200 series"

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Realizing Precision Control in Energy Innovation (Brooks Instrument Solutions Supporting a Sustainable Future)

Realizing Precision Control in Energy Innovation (Brooks Instrument Solutions Supporting a Sustainable Future)

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Comprehensive Catalog Product Guide 'flow-pressure-vapor-guide'

Comprehensive Catalog Product Guide 'flow-pressure-vapor-guide'

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ITWジャパン

ITWジャパン

Machine elements and parts

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Our company provides products used in various fields, including heavy industry, oil and gas refining, research in chemistry and petrochemicals, production of pharmaceuticals and biopharmaceuticals, as well as manufacturing equipment for solar cells, LEDs, thin films, optical fibers, and semiconductors. By contributing to the environmental settings that enable process control and accurate measurements, we enhance the precision of our customers' processes, continuously supporting them to maintain their competitiveness while striving for mutual improvement, leading to the development and growth of their businesses. Please feel free to consult us if you have any requests.

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