Full automatic sputter coater with magnetron cathode to reduce ion damage.
Lightweight and compact desktop sputter coater with high reproducibility 【Features】 ○ Equipped with a magnetron cathode that reduces ion damage ○ The magnetron cathode contributes to the production of high-quality thin films ○ Fully automatic from exhaust to coating to atmospheric release ○ Easy coating of sputtered thin films for electrodes
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basic information
【Specifications】 〇 Target Size: φ49mm 〇 Applicable Targets: Au/Au-Pd/Pt/Pt-Pd/Ag 〇 Sample Size: φ50mm (Max) 〇 Exhaust Operation: Automatic 〇 Exhaust Device: Directly Connected Rotary Pump 20L/min (with Automatic Leak) 〇 Sputtering Method: DC Magnetron/Parallel Plate Type 〇 Dimensions (W/D/H): 225/420/320mm
Price information
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Price range
P5
Delivery Time
Applications/Examples of results
【Applications】 ○ Creation of sputtered thin films for electrodes ○ Production of reflective films ○ Pre-treatment of samples for SEM, etc.
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The management philosophy is to "pioneer the future of research and development with core technology." Our motto is to provide those involved in research and development with what they need at the right time, while enhancing the "expandability of device functions" and offering a "variety of options." Additionally, leveraging our "agility," we strive daily to meet the diverse needs of our customers.