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  6. SiOC-200C Oxygen Partial Pressure Control Device

SiOC-200C Oxygen Partial Pressure Control Device

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last updated:Oct 01, 2010

エスティー・ラボ
エスティー・ラボ
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Controls the oxygen concentration in the gas.

The oxygen concentration is controlled by a variable constant PID feedback circuit.

    Other FA equipment
i-Oxgen.jpg

SiOC-200C Oxygen Partial Pressure Control Device

i-Oxgen.jpg
i-Oxgen.jpg

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basic information

【Features】 ○ An inert gas is passed through an oxygen pump with a platinum electrode attached to an oxygen ion conductor. ○ The oxygen concentration in the inert gas is controlled and maintained in the range of 1 to 10E-30 atm (Type C circulation type). ○ Dimensions are W220 x H378 x D570. ● For more details, please contact us or download the catalog.

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Applications/Examples of results

Superconducting materials; new high-temperature superconducting materials Ion-conducting materials; fuel cells (SOFC) Oxide semiconductors: solar cell devices MOX fuel; nuclear fuel

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SiOC-200C Catalog

SiOC-200C Catalog

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エスティー・ラボ

エスティー・ラボ

Testing, Analysis and Measurement

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We develop and provide a new type of oxygen partial pressure control device that balances high functionality and low cost, high-temperature superconducting devices, high-temperature solid oxide fuel cells (SOFC), antenna data visualization software necessary for mobile phone development, and control systems for fuel cell testing equipment, contributing to research and development in companies and universities, as well as to development-type commissioned projects adopted by governments and other organizations.

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Related Products from エスティー・ラボ

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On-type oxygen partial pressure control device SiOC-200C
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Wet-type oxygen partial pressure control device SiBOC-200D
Wet-type oxygen partial pressure control device "SiBOC-200D"
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Wet-type oxygen partial pressure control device "SiBOC-200D"

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