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  5. Other process controls
  6. On-type oxygen partial pressure control device SiOC-200C

On-type oxygen partial pressure control device SiOC-200C

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last updated:Oct 01, 2010

エスティー・ラボ
エスティー・ラボ
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The oxygen partial pressure is adjusted and measured using a zirconia-type oxygen sensor.

This device adjusts the oxygen partial pressure through equilibrium reactions by adding hydrogen (H2) and water vapor (H2O) at arbitrary concentrations to the test atmosphere gas (such as Ar), and measures it using a zirconia oxygen sensor. This device enables rapid adjustment of the oxygen partial pressure in the test atmosphere gas, and can measure extremely low oxygen concentrations (1 to 10E-30 atm O2) using the included oxygen sensor (SiOC-200C).

    Other process controls
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On-type oxygen partial pressure control device SiOC-200C

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basic information

【Features】 ○ This is a device for adjusting an extremely low oxygen atmosphere (approximately 10E-30 atm O2) using H2/O2 balanced gas. ○ It can quickly provide an extremely low oxygen atmosphere. ○ The included high-sensitivity oxygen sensor allows for monitoring of oxygen partial pressure. ● For other functions and details, please contact us.

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【Purpose】 ○ Adjustment of oxygen partial pressure ● For other functions and details, please contact us.

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ST Lab Co., Ltd.

ST Lab Co., Ltd.

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エスティー・ラボ

エスティー・ラボ

Testing, Analysis and Measurement

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We develop and provide a new type of oxygen partial pressure control device that balances high functionality and low cost, high-temperature superconducting devices, high-temperature solid oxide fuel cells (SOFC), antenna data visualization software necessary for mobile phone development, and control systems for fuel cell testing equipment, contributing to research and development in companies and universities, as well as to development-type commissioned projects adopted by governments and other organizations.

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