Spectroscopic ellipsometer for thin film measurement. Supports high-precision measurement of various thin films.
It is possible to select a system for high-speed and wide wavelength range measurement (190-1700 nm) using a CCD detector, as well as high optical resolution measurement (190-2050 nm) using a double monochromator. By adding various options (such as infrared spectroscopic ellipsometer, GXR, etc.), more precise measurements can be achieved.
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basic information
It is possible to select a system for high-speed and wide wavelength range measurement (190-1700 nm) using a CCD detector, as well as high optical resolution measurement (190-2050 nm) using a double monochromator. By adding various options (such as infrared spectroscopic ellipsometer, GXR, etc.), more precise measurements can be achieved.
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Applications/Examples of results
Thin films for semiconductors - SiO2, SiN, c-Si, poly-Si, a-Si, SOI, low-k, high-k, SiGe, 2-6 series multilayer films, 3-5 series multilayer films, etc. Optical thin films - dielectric multilayer films, lens coatings, phase mirrors, phase shifters, photonics, etc. Thin films for display devices - TFT LCD, PDP, organic EL, etc. In addition, various other thin films can be measured.
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We will respond to the diverse and advanced needs of all industrial sectors with our comprehensive capabilities.
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