It is a product that does not affect the liquid components being heated.
This device is used to heat ultra-pure water, which is utilized for cleaning silicon wafers, liquid crystal glass substrates, hard disk substrates, and various components, using a carbon heater. 【Features】 - The pure water heating container is made of quartz glass. - The pure water contact piping is made of fluororesin. - A carbon heater suitable for pure water heating is used. - Heating efficiency is over 96%. - Stable temperature control within ±1°C using PID control. - Heating up to the operating temperature within 120 seconds from startup. - Compatible with a wide range of flow rates and temperatures. - Temperature adjustment in response to flow rate changes is possible. *For more details about the product, please refer to the "PDF Download" button below. *Feel free to contact us with any inquiries.
Inquire About This Product
basic information
【Specifications】 ○ Heating capacity: 12 liters/min, ΔT = 55.0℃ (for 12N) ○ Maximum set temperature: 85℃ ○ Temperature adjustment accuracy: ±1℃ ○ Number of heating tanks: 2 (for 12N) ○ Number of heaters: 12 (for 12N) ○ Power supply (for control): AC200V 5A
Price information
-
Delivery Time
Applications/Examples of results
【Usage】 ■Dicer (embedded in equipment) ■Wet processing equipment 【Examples of Achievements】 Used independently
Line up（1）
| Model number | overview |
|---|---|
| HDM－３ |
catalog（1）
Download All Catalogs
Company information
"Surely, for what is in the future." With this theme, we focus on the design and manufacturing of semiconductor manufacturing equipment and related devices, developing products that meet our customers' needs. We hope that the technologies we possess can be commercialized in various fields and be of benefit to our customers. Our entire staff is passionately engaged in the process of turning our customers' ideas into products, including research and development and prototyping. We sincerely look forward to your inquiries.