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  6. Spin coating device

Spin coating device

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last updated:Oct 01, 2010

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Spin coating device

The process from developing the resist film applied on the glass substrate while rotating it to rinsing with pure water is performed automatically. 【Features】 ● A developing solution purge mechanism is provided, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The nozzle movement can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For details, please request the materials.

    Analytical Equipment and Devices
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Spin coating device

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The process from developing the resist film applied on the glass substrate while rotating the substrate to rinsing with pure water is performed automatically. 【Features】 ● It is equipped with a developing solution purge mechanism, making it easy to change the type of developing solution. ● A robot is used for the left-right movement of the nozzle. The movement of the nozzle can be set arbitrarily over a wide range of 0 to 400 mm. ● The vertical position of the nozzle can be set arbitrarily over a wide range of 0 to 500 mm. *For more details, please request the materials.

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Spin coating device

Spin coating device

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Ferrous/Non-ferrous metals

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The name of the new organization, Maple Co., Ltd., which aims to achieve development through a new stage in the field of precision processing and assembly, embodies the fundamental policy of "organizations are people" that has been inherited from the past, as well as the concept of "people think, people create." Make People. "Creating people" along with "people create." This attitude embedded in our company name symbolizes the way we aspire to shape our organization and business in the future.

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