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  6. [SSRM] Scanning Spreading Resistance Microscopy

[SSRM] Scanning Spreading Resistance Microscopy

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last updated:Apr 02, 2026

一般財団法人材料科学技術振興財団 MST
一般財団法人材料科学技術振興財団 MST
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Local resistance measurement at the nanometer level is possible.

SSRM is a method that visualizes the spreading resistance directly beneath the probe by scanning the surface of a sample with applied bias using a conductive probe and measuring the distribution of resistance values in two dimensions. When measuring silicon semiconductor devices, it is sensitive to carrier concentrations of 10^16 cm^-3 or higher, depending on spatial resolution. - Local resistance measurement at the nanometer level is possible - Effective for measuring the dopant concentration distribution in semiconductors - Cannot determine the polarity of semiconductors (p-type/n-type) - Quantitative evaluation is not possible

    Contract AnalysisContract measurementContract Inspection
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[SSRM] Scanning Spreading Resistance Microscopy

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  • Related Link - https://www.mst.or.jp/service/method/ssrm/
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basic information

■What is spreading resistance? Spreading resistance refers to the measurement of resistance values by applying a bias voltage to a sample, allowing carriers located directly beneath the probe to flow into the probe, and amplifying that current with a logarithmic amplifier. At this time, the applied bias voltage rapidly attenuates directly beneath the probe. Therefore, the carriers that can flow into the probe are limited to those that are very close to the probe, and this is detected as a resistance value. This type of local resistance is called spreading resistance. ■Diamond-coated probe In SSRM, probes made of silicon with a diamond coating are mainly used. The tip of these probes is sharpened to a few tens of nanometers, and particularly the pointed part has a sharpness of a few nanometers. SSRM enables high-resolution measurements to detect carriers located directly beneath this fine probe.

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Applications/Examples of results

- Local resistance measurement Evaluation of the diffusion layer shape of silicon semiconductor devices (MOSFET) Evaluation of the diffusion layer shape of compound semiconductor devices (LEDs, laser devices, power MOSFETs) Evaluation of resistance distribution in compound solar cells and lithium-ion secondary batteries Measurement of leakage spots in insulating films

Detailed information

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    Please consult with us first. ★ We will start by proposing an analysis plan ★ Meetings at your company are, of course, possible. We will carefully explain the analysis results and leave no questions unanswered. Please contact us at 03-3749-2525 or info@mst.or.jp!

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    We will hold a visiting seminar. ★ We offer free seminars with engineers visiting to meet customer needs ★ Depending on your requests, we will introduce analysis techniques and explain analysis data. ◆ Example seminar content - Broad explanation of MST analysis methods - In-depth explanation of specific analysis methods from the principles - Explanation of analysis data requested by the customer Please contact us at 03-3749-2525 or info@mst.or.jp!

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一般財団法人材料科学技術振興財団 MST

一般財団法人材料科学技術振興財団 MST

Testing, Analysis and Measurement

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MST is a foundation that provides contract analysis services. We possess various analytical instruments such as TEM, SIMS, and XRD to meet your analysis needs. Our knowledgeable sales representatives will propose appropriate analysis plans. We are also available for consultations at your company, of course. We have obtained ISO 9001 and ISO 27001 certifications. Please feel free to consult us for product development, identifying causes of defects, and patent investigations! MST will guide you to solutions for your "troubles"!

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