Stable oscillation from low to high output to meet a wide range of needs for sheet cleaning!
The Fine Series Cleaning Unit "Fine Jet" allows for fine output adjustments with stable output control in 1W increments. It offers a variety of selectable frequencies (400/1500/3000 kHz) and a range of nozzle variations (chemical-resistant/metal contamination-free). The detection function has been enhanced to detect transducer degradation. Additionally, the communication function has been improved, enabling monitoring of the oscillator's status and external settings. It is compatible with international voltages as standard and meets various standards (FCC/CE/RoHS). For more details, please contact us or refer to the catalog.
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basic information
【Features】 ○ High-frequency liquid (ultrapure water, chemical solution) is sprayed from the nozzle tip for cleaning → Chemical solutions such as ozone water and hydrofluoric acid can be used according to the application ○ Unlike high-pressure water jets, the supplied liquid can be at standard water supply pressure (1-1.5 Kg/cm²) ○ Easily attachable to single-sheet feed and spin cleaning machines ○ Stable oscillation from low to high output ○ Meets a wide range of needs for single-sheet cleaning ○ Fine output adjustment: Stable output adjustment in 1W increments is possible ○ Various frequencies can be selected: 400/1500/3000 kHz ○ Diverse nozzle variations: Chemical-resistant / metal contamination-free ○ Enhanced detection function: Capable of detecting transducer degradation (PT-010J50) ○ Enhanced communication function: Monitoring of oscillator status and external settings possible (PT-010J50) ○ Standard support for overseas voltages (PT-010J50) ○ Compliance with various standards: FCC/CE/RoHS ● For more details, please contact us or refer to the catalog.
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Applications/Examples of results
【Applications】 ○ Cleaning of silicon wafers, GaAs, various photomasks, LCD glass, magnetic disks, and thin-film magnetic heads, as well as cleaning after wafer CMP. ○ Removal of clogging and promotion of processing during slicing, beveling, and machining of brittle materials (such as ferrite, ceramics) and silicon wafers. ○ LCD removal. ○ Cleaning of various wafer substrates (silicon, polysilicon, compound semiconductors, quartz glass). ● For more details, please contact us or refer to the catalog.
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Company information
Since its establishment in 1982, Pretech has consistently created super cleaning systems in various fields of ultra-precision cleaning. In particular, our fine series of megasonic cleaning and cassette-less cleaning have been developed early on and have received high praise both domestically and internationally. Additionally, Pretech promotes the development of new technologies based on industry-academia collaborative research. We are engaged in joint development with Tohoku University on energy-saving, high-quality sheet-type cleaning machines, as well as with Yamagata University, Tokyo Institute of Technology, and Chuo University. Moving forward, we aim to realize three policies: a thorough commitment to customer-first priority, the establishment and maintenance of a quality assurance system, and the development and application of cutting-edge technologies. We strive to create and provide attractive products that earn the trust and satisfaction of our customers, while also contributing to society by improving the environment and health and safety. To grow and develop as a true venture company, we will continue our research and development of cutting-edge technologies in precision cleaning, promoting Japanese-origin technologies to the world, and making Japan a solid technological nation through the collective efforts of all our employees.