Ideal for cleaning various types of wafers, photomasks, magnetic disks, and more.
The Fine Series Cleaning Unit "Fine Sonic" removes particles below submicron size and efficiently transmits sound waves through a special vibration element, without damaging the workpiece. It offers a variety of selectable frequencies (750/1000/1500/2000 kHz) and allows for fine output adjustments with stable output control in 1W increments. The maximum output has been increased, allowing for an expanded cleaning area. Additionally, communication functions have been enhanced, enabling monitoring of the oscillator status and external settings. It also complies with various standards (FCC/CE/RoHS). For more details, please contact us or refer to the catalog.
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basic information
【Features】 ○ A batch-type high-frequency cleaning unit that has evolved to meet needs ○ Removes particles smaller than submicron ○ Efficiently transmits sound waves through a special vibration element without damaging the workpiece ○ Eight levels of output switching available via external signals ○ Easy connection with external devices such as sequencers through highly reliable CPU control ○ Achieves uniform sound pressure ○ Various frequencies selectable: 750/1000/1500/2000 kHz ○ Fine output adjustment: stable output adjustment in 1W increments is possible ○ Increased maximum output allows for an expanded cleaning area ○ Enhanced communication functions: monitoring of oscillator status and external settings available (PT-150MV) ○ Complies with various standards: FCC/CE/RoHS ● For more details, please contact us or refer to the catalog.
Price information
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Delivery Time
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Applications/Examples of results
【Applications】 ○ Final cleaning after mirrors such as silicon wafers and GaAs ○ RCA cleaning before diffusion and after ion implantation in semiconductor devices ○ Cleaning of wafer cassettes (carriers) ○ Cleaning before and after film formation of various photomasks, blanks, and reticles ○ Cleaning before film formation and final cleaning of magnetic disks ○ Cleaning before film formation of LCD glass and similar materials ○ Cleaning of various wafer substrates (silicon, polysilicon, compound semiconductors, quartz glass) ○ Various electronic components ● For more details, please contact us or refer to the catalog.
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Company information
Since its establishment in 1982, Pretech has consistently created super cleaning systems in various fields of ultra-precision cleaning. In particular, our fine series of megasonic cleaning and cassette-less cleaning have been developed early on and have received high praise both domestically and internationally. Additionally, Pretech promotes the development of new technologies based on industry-academia collaborative research. We are engaged in joint development with Tohoku University on energy-saving, high-quality sheet-type cleaning machines, as well as with Yamagata University, Tokyo Institute of Technology, and Chuo University. Moving forward, we aim to realize three policies: a thorough commitment to customer-first priority, the establishment and maintenance of a quality assurance system, and the development and application of cutting-edge technologies. We strive to create and provide attractive products that earn the trust and satisfaction of our customers, while also contributing to society by improving the environment and health and safety. To grow and develop as a true venture company, we will continue our research and development of cutting-edge technologies in precision cleaning, promoting Japanese-origin technologies to the world, and making Japan a solid technological nation through the collective efforts of all our employees.