Providing mass production solutions for high-speed and flexible substrate film deposition applications!
This is a research and development sputtering device suitable for various film deposition applications, featuring high-level specifications and a wide range of options.
Experimental device equipped with an ion source, applicable for ultra-thin film multilayer deposition in precision optics.
There are five expansion slots, allowing for additional installation of sputter chambers, deposition devices, glove boxes, etc.
Flexibility, compact design, and low investment costs! An ideal choice for small-scale production.
This is a sheet-type sputtering device that achieves high-quality radio wave transmission films.
Meeting the high cleanliness standards required in the semiconductor and medical device fields. We carry out everything from precision cleaning to packaging and assembly in a consistent clean environment.
Film thickness distribution: Achieved ±1.2% within the tray and ±1.5% between trays.
A book that I want to have on hand!
Substrate × Film = Optical adjustment, conductivity, antibacterial/antiviral! Exhibits heat insulation and thermal retention effects.
Introducing the ion beam sputtering device equipped with a maximum of 5 targets (220mm diameter) or 4 targets (300mm diameter)!
1-inch UHV-compatible sputter cathode with 2 sources! The load lock chamber can be expanded!
It is a device that can be transitioned from a pilot line to a mass production line.
From surface modification to catalyst utilization! Introducing high-adhesion powder sputtering technology with examples of film formation!
High-precision and reliable metal seal model
Vacuum components compatible with high vacuum and ultra-high vacuum.
Product Variety Vacuum Components - Adapter Series
Sapphire vacuum viewport welded using patented dissimilar material welding technology.
This device can clean adhesive rolls during maintenance more quickly and efficiently, addressing a challenge that has troubled customers across various industries!
Ideal for use in clean rooms! It is a fully automatic system for cleaning rolls.
The ULT roll-to-roll web cleaner device stably removes dust even at a converting production line speed of 300m/min.
Shortest half-day estimate / From metal parts to resin products, we introduce components related to semiconductor manufacturing equipment based on our track record!
We provide vacuum deposition equipment and related maintenance services.
Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.
Small film deposition device for experiments. It deposits films on materials such as PET.
Coating equipment for manufacturing functional films for Flexible Displays.
A versatile vacuum deposition device that allows for flexible configuration changes like assembling blocks | Sputtering, resistance heating deposition, electron beam deposition, organic deposition.
Resistance heating evaporation source for the multi-purpose vacuum deposition device HEX system.
Multi-purpose vacuum deposition device for HEX system with 1-source and 4-source electron beam deposition sources.
Organic deposition source for the multipurpose vacuum deposition device HEX system.
Multipurpose Vacuum Deposition Device HEX System Sample Stage | Fixed, Rotating, Rotating Heating, Rotating Water Cooling
Metal films and protective films can be deposited automatically on resin substrates!
A must-see for engineers considering new film formation methods! Fully automated film formation of metal films and protective films on resin substrates.
A film formation technology with excellent reproducibility that utilizes high energy to forge the material itself!
Compact design yet maintains performance! A sputtering device capable of substrate heating at high temperatures.
It is possible to operate and monitor voltage and current settings.
Difficult materials, various substrate shapes, and applications! Capable of accommodating a very wide range of substrate sizes.
Ion beam sputtering equipment for research and development as well as small-scale production!
For engineers in the wear-resistant coating industry! Precise control of film stress.
Rich experience in processing various materials and substrates! Effective sputtering technology for mold prevention as well.
Suppress the growth of bacteria/viruses with metals/alloys! Sputtering processing on fibers is possible.
Rich experience in processing various materials and substrates! Electromagnetic wave shielding, static electricity prevention, surface heating elements, etc.
Higher productivity for PLP! More process possibilities. Optimized for advanced packaging.
Extremely low Rc system design in the industry and the highest level of inter-wafer reproducibility!
A film deposition platform for semiconductor wafers and advanced packaging capable of various film deposition treatments.
From site surveys to design and construction, experienced engineers will handle it!
Leave the manufacturing of semiconductor sputtering targets to us.
Reduce initial implementation costs and enable high performance through expansion! Upgrade according to the research stage.
Easy discharge operation! Compact design with automatic matching for RF power supply.
Electrode formation processes and mounting processes for various devices such as LEDs, LDs, and FETs are possible.
A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.
Equipped with two connection ports for sputtering devices and PLD devices! Samples can be transferred to each sample holder.