Compatible with high aspect ratio TGV/TSV. The world's largest chamber size (1000mm□) for ALD.
Damage-free, particle-free atmospheric pressure plasma device
The compound semiconductor wafers (GaAs, InP, GaP) are transported to a designated position non-contactly through manual operation.
It is an atmospheric pressure plasma device. It is ideal for adhesion, cleaning, and more.
Instant curing with UV irradiation. Protects the target areas from blasting, acids, alkalis, and paints. There are various methods for removal.
Cleaning the sample surface with + ions generated by plasma discharge.
Easily download, search, list, and output files of atomic spectrum data published by NIST.
Introducing a plasma cleaner that can be used under atmospheric pressure to remove fine dirt from the work surface!
The metal-free type eliminates metals to the utmost extent, achieving a higher level of purity! Recommended for clean processes such as silicon semiconductor manufacturing!
Low-temperature, electrically damage-free atmospheric pressure plasma device.
The precision wobble stick was developed for delicate operations within ultra-high vacuum chambers, minimizing the risk of damage to the equipment!
Freely operate with robots! Surface modification of hollow bottles and molded products with uneven surfaces is possible.
Complete integration of hydrophilic treatment, deposition equipment, and ion sputtering functions.
We sell various plasma devices, including low-pressure types that can accommodate a wide range of materials and atmospheric pressure types that can be installed inline.
You can easily use a nitrogen generator on the table. As long as there is electricity, the supply of nitrogen can be maintained!
It is said to be difficult in ALD, but film formation from powder is possible at low temperatures (room temperature to 100°C) and atmospheric pressure!
Supports cleaning, surface treatment, surface modification, and adhesion enhancement! With timer function!
The integrated power supply improves mobility. Due to its handheld design, it is also capable of partial treatment of large objects and plasma irradiation on three-dimensional items.
Surface modification, cleaning, hydrophilic treatment, and adhesion enhancement with excellent low-temperature charge damage-free! Pen-type atmospheric pressure plasma device!
An atmospheric pressure plasma treatment device that enables stable plasma treatment at atmospheric pressure! The miniaturization of the device makes it easy to integrate into production lines!
Has numerous achievements in leading companies in Asia.
Mechanisms of superhydrophobic and superhydrophilic technology, surface modification techniques using coatings, and evaluation of water repellency.
Simultaneously improve quality and efficiency with atmospheric pressure plasma treatment! Suitable for adjusting surface wettability and enhancing adhesion. [Exhibiting at the October 2023 Mechanical Technology Elements Exhibition in Osaka]
Low-temperature film formation. High insulation, high barrier, uniformity!
Innovative surface treatment of powders by IonPOWDER. Surface modification is performed on powders through ion implantation.
It is possible to reduce friction while maintaining the elastic properties of rubber! It is effective in preventing wrinkles during transport caused by grip.
Industry's smallest size! Compact and low-cost tabletop plasma treatment device.
Operates at extremely low temperatures and low vacuum levels that are not found in hot cathodes!
Using a dedicated vacuum deposition device, we deposit as a gas! It easily penetrates the cracks of components, achieving a complete and uniform coating.
Ideal for R&D equipment using MWPECVD! MW-SURFATRONS are compatible with atmospheric pressure or reduced pressure.
It can also be used as a production machine and is adopted by many users.
3D, large-scale, low-temperature processing possible! Plasma ion implantation film deposition device using proprietary development technology.
Adaptable to various metal materials such as titanium alloys and nickel alloys! A clean heat treatment device that does not emit CO2.
Supports etching of fine patterns of metal films such as Al and Cr! Demo machines available! Facility tours and sample testing are currently being conducted.
Multi-functional, compact, flexible support, a standard lineup with proven results and trust.
Supports automated mass production lines. Inline type, sheet type, and various types with flexible hardware configurations, all with a proven track record of high effectiveness of vacuum plasma in mass production lines.
Forming crystalline AlN films with high-density plasma sputtering, compatible with full coating on three-dimensional shapes. Fully automated mass production equipment lineup.
Nozzle widths from 10mm to 70mm can be easily replaced with simple work. One machine can accommodate a wide range of applications.
Solving adhesion issues in applications such as bonding, printing, and coating of olefin-based resins and elastomers!
Direct adhesion with films such as liquid crystal polymers, fluororesins, and PP, as well as with dissimilar materials is possible. *Materials comparing the differences with corona, light, and wet methods will be provided.
Atmospheric pressure plasma device enabling direct bonding in the 5G and 6G FCCL market.
Direct bonding technology and electroless plating pretreatment to reduce transmission loss!
Successful superhydrophilization of Teflon (PTFE/PFA) using an atmospheric pressure plasma device, achieving a contact angle near 5 degrees (in pure water).
Eliminate surface damage and other issues by using atmospheric pressure and downstream plasma! By changing the type of added gas, surface functionalization molecules can be easily applied!
Substrate treatment testing is possible! Plasma wedge enhances hydrophilicity, adhesion, coating properties, and printability on all substrate surfaces in the atmosphere.
Various functional groups (hydrophilic, lipophilic, adhesion improvement, etc.) can be chemically bonded to various substrates and films according to their applications.
Achieving "direct plating without roughening" for difficult-to-plate resins and difficult-to-bond resins, as well as "adhesive-free direct bonding" and "improved adhesion with adhesives"!
Achieving high-speed surface modification of films in a nitrogen atmosphere.
Air Water Group's surface modification contract processing service. We provide plasma treatment tailored to our customers' needs.
Introducing case studies of solutions using Openair-Plasma® in the automotive manufacturing industry.
PVD coating refers to a method of physically vaporizing and depositing high-melting-point materials such as metals using electrical power.
Functional ceramic films of various types are coated in single or multiple layers using the thermal chemical vapor deposition method, enhancing the performance of the material with the resulting high hardness and high adhesion ceramic films.
Tabletop plasma etching device capable of localized processing with unique spot plasma technology.
"Advanced Visible Plasma" is recommended for processing three-dimensional objects and thick workpieces, such as 3D glass and PCBs.
Performance has improved, and productivity has also increased! Stronger than UV treatment, but weaker than blasting or polishing treatments are possible.
A design that does not require low power and special processing gases! Processing is possible in 20 to 120 seconds depending on the material!
Vacuum plasma and corona treatment generator! Most important parameters can be controlled and adjusted!
Multi-layer film formation enables the improvement of load-bearing capacity for low-temperature DLC (Diamond-like carbon) thin film hard coatings!
If you are troubled by adhesion, printing, or lamination defects, "modify" the film surface with atmospheric pressure plasma.
To the 'water-resistant resin,' the power to get wet. With the 'hydrophilization' of plastic, both decoration and adhesion change.
Speedy and uniform! A sparkless and damage-free atmospheric pressure plasma system.
Multiple plasma technologies can be integrated into a single device!
This is an introduction to environmentally focused nitriding treatment using plasma energy in a vacuum.
Ultra-compact! A surface modification device that can be used on a desk!
Patent obtained! Plasma treatment device capable of concentrated modification of the inner wall surfaces of containers with various shapes.
Color measurement was conducted using the Konica Minolta automatic scanning spectrophotometer FD-9, and color difference mapping was performed!
Nitriding of cutting tools is possible! We recommend composite hardening treatment using Atom nitriding and PVD coating!
Condensing 30 years of progress from the previous edition, covering everything from fundamentals to applications and practical use. To be useful in practical work, numerous diagrams are used to present applied technology examples.
Atmospheric pressure plasma device that achieves high processing capability at a low cost.
Atmospheric pressure plasma device that balances high processing capability and safety.
Significant cost reduction, environmentally friendly Air model.
Compatible with 6-inch and 8-inch wafers! Plasma processing equipment using a parallel plate method.
Leveraging our manufacturing achievements in plasma devices, we offer plasma treatment tailored to your company's needs! We accommodate small lots and short delivery times!
A dense and efficient thermal spray coating can be obtained! The newly designed nozzle electrode achieves longer lifespan.
It is optimal for the processes of CVD, etching, and surface modification.
[Nationwide Service Available] We can perform thermal spraying on a wide variety of parts! We provide careful support from proposal to thermal spraying, delivery, and aftercare in a consistent system.
A curved trajectory that moves the plasma head along the curved surface of the substrate! Effective for improving wettability.
This is a foil with a hairline pattern on the surface created by using a hairline processed foil-based PET film.
"Plami-α" is a compact and user-friendly atmospheric pressure plasma generation device. It can be easily used for surface modification and activation anytime, anywhere!
It is a coating device for tungsten thin films for electron microscopes.
A high-performance device that can accommodate all applications. Just one button press after adjustment, and you're good to go!
High functionality and low price! Equipped with a touch panel full-auto coating feature, all performance has been powered up!
Excellent wear resistance and corrosion resistance! Coating various materials without thermal impact!
Has numerous achievements in leading Asian companies.
Has numerous achievements in leading Asian companies.
Many achievements with major Asian electronics manufacturers! We propose surface treatment in various fields!
A set of 5 technical documents on surface treatment as a gift!
We will introduce energy semiconductor device research and development systems compatible with φ4-inch substrates!
Contributes to reducing engineering costs and improving substrate quality! Enables high coating adhesion.
Formation of passivation films such as a-SiC:H (hard films) is possible! Surface decontamination using high-density plasma.
Damage-free with low-temperature treatment and electric field shielding structure! It is adopted in many production processes, including LCD factories.
Ideal for the optical film field! Achieves high uniformity and damage-free film (no particle generation)!