List of Sputtering Equipment products

Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

• Other conveying machines

Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!

• Cooling system

A composition distribution with several hundred conditions is formed on a single substrate. The effective film formation area is an equilateral triangle with a side length of 25 mm.

• Sputtering Equipment

Effective area of a 25mm side triangle! It forms a composition distribution of hundreds of conditions on a single substrate.

• Sputtering Equipment

Aluminum processing, anodizing treatment, Osaka [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• CVD Equipment
• Evaporation Equipment

It is an introduction device that transmits linear motion from the atmospheric side to samples and equipment in a vacuum.

• Sputtering Equipment
• CVD Equipment
• Other semiconductor manufacturing equipment

For adjusting shaft misalignment and angle when installing a magnetic coupling linear rotary introducer (MFL)!

• Sputtering Equipment
• Other semiconductor manufacturing equipment

Please use it for deposition protection and light/beam blocking for the viewing port.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

We will manufacture a vacuum chamber.

• CVD Equipment
• Sputtering Equipment
• Other semiconductor manufacturing equipment

Conductive carbon thin films are formed by sputtering. Stable film formation is achieved through a simple process with inert gas and carbon target at low temperatures (below 400°C).

• Sputtering Equipment
• Plasma surface treatment equipment
• Other processing machines

Aluminum precision parts for semiconductor manufacturing equipment, Osaka. [Leave cost reduction to Philir Co., Ltd.]

• Sputtering Equipment
• Ion implantation equipment
• Evaporation Equipment

Development of new thin films using simultaneous three-source sputtering! Customizable according to experimental content and budget.

• Sputtering Equipment

Multi-layer film deposition using a maximum of 5 yuan cathodes. Wear resistance, heat resistance, and smooth thin films. High throughput even for high-temperature deposition with a load lock type.

• Sputtering Equipment
• Plasma surface treatment equipment

From discrete components to advanced devices, from R&D to mass production. A compact, high-quality, multi-purpose CtoC type sputtering system.

• Sputtering Equipment
• Plasma surface treatment equipment
• Other mounting machines

Currently responding to sample tests, developing films and metal foils for flexible devices and advanced functional materials, and supporting mass production. Process support with demo equipment.

• Other processing machines
• Sputtering Equipment
• Plasma surface treatment equipment

A lineup with over 20 years of proven history. Customized processes and hardware for high-end niche processes from R&D to mass production.

• Sputtering Equipment
• Plasma surface treatment equipment

AlN templates for UV-LEDs using sputtering. AlN films with high crystallinity and C-axis orientation can be created by sputtering. Latest model deposition equipment.

• Sputtering Equipment
• Plasma surface treatment equipment