List of Electric furnace products

  • classification:Electric furnace

31~45 item / All 506 items

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

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  • Other conveying machines

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Presentation of explanatory materials on JIS and ISO standards. We propose suitable safety barriers from a rich product series! Free rental of demo kits.

  • Satech - AdaptaGuard_Ipros_2023_JP_1.jpg
  • Satech - BlueGuard_Ipros_2023_JP_1.jpg
  • Satech - EasyGuard_Ipros_2023_JP_1.jpg
  • Satech - FastGuard_Ipros_2023_JP_2.jpg
  • Satech - ImpactGuard_Ipros_2023_JP_1.jpg
  • Satech - EasyGuard_Ipros_2023_JP_Media-gallery_1.jpg
  • Satech - ImpactGuard_Ipros_2023_JP_Media-gallery_2.jpg
  • Satech - AdaptaGuard_Ipros_2023_JP_Media-gallery_1.jpg
  • Satech - BlueGuard_Ipros_2023_JP_Media-gallery_2.jpg
  • Other safety and hygiene products

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For those who want to use halogen as process gas and are troubled by emissions from samples.

  • Electric furnace

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We handle electric furnaces from various manufacturers.

  • Electric furnace

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The best proposal for the core process of magnetic devices. Annealing equipment provided by a magnetic specialty manufacturer.

  • Heating device
  • Electric furnace
  • Industrial Furnace

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Minimize work inside the glove box ◎ Screening of solid electrolyte materials / Impedance evaluation by temperature characteristics ◎ Multiple uniform, short time, and accurate test evaluation

  • Lithium-ion battery
  • Secondary Cells/Batteries
  • Electric furnace

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OCT搭載加熱観察イメージ炉.png

"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.

The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.

Rapid heating at approximately 50°C/sec using focused light heating method, with the possibility of rapid cooling when the heating lamp is turned off. Compatible with various atmospheres.

  • Electric furnace

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OCT搭載加熱観察イメージ炉.png

"OCT-equipped heating observation imaging furnace" contributes to global research! Direct observation of internal structural changes at high temperatures.

The "OCT-equipped heating observation furnace" is a compact design that utilizes a focused heating method and is an internal observation device equipped with OCT (Optical Coherence Tomography). Using this device, a research group from Yokohama National University and the Kanagawa Institute of Industrial Science and Technology successfully observed the internal structural changes of ceramics during sintering at high temperatures for the first time in the world. For more details, please refer to the catalog. If you have any questions or inquiries, please feel free to contact us.

Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.

  • Heating device
  • Electric furnace
  • Annealing furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

Tabletop small-sized experimental furnace - space-saving, with a maximum operating temperature of 2000°C! We also manufacture metal furnaces for reducing atmospheres.

  • Heating device
  • Electric furnace
  • Other heaters

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1.jpg

4-Yen Multi-Sputtering Device 【MiniLab-S060】

4 cathodes with Φ2 inch configuration Simultaneous film deposition: 3-component simultaneous deposition (RF 500W or DC 850W) + HiPIMS (PulseDC 5KW) x 1 Power distribution and configuration settings for 4 cathodes can be freely changed via the HMI screen using the plasma relay switch 3 MFC systems (Ar, O2, N2) for reactive sputtering RIE etching stage RF 300W (main chamber) + <30W soft etching (LL chamber) Substrate heating: Max 500℃, 800℃, or 1000℃ (C/C or SiC coating) Substrate rotation and vertical movement (automatically controlled by stepping motor) APC automatic control: Upstream (MFC flow adjustment) or downstream (automatic valve opening adjustment on the exhaust side) Dimensions: 1,120(W) x 800(D) ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.

We provide development and design technology for heating furnaces and heating systems with 30 years of experience in drawing furnaces and vitrification furnaces for optical fibers.

  • Industrial Furnace
  • Electric furnace
  • Semiconductor inspection/test equipment

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Hot air drying oven

  • Electric furnace

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Conveyor-type far infrared heating furnace

  • Electric furnace

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Continuous Wet Hydrogen Furnace

  • Electric furnace

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