List of Scientific and Physics Equipment products

  • classification:Scientific and Physics Equipment

2386~2430 item / All 36622 items

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Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!

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  • Other conveying machines

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Amino acid-derived natural cationic polymer that can be used in food preservatives, hygiene materials, and daily necessities. It is a safe material as it is a fermentation product produced by natural ...

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  • Shelf life enhancer

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Introduction of the preservative polylysine / fermented polyamino acids that contribute to food poisoning prevention.

We provide easy-to-understand materials explaining the natural preservative polylysine, which prevents food poisoning. ε-Polylysine (hereafter referred to as polylysine) is an amino acid-derived preservative widely used as a food preservative. By adding polylysine, the growth of microorganisms that cause food poisoning can be prevented. Every year, food poisoning caused by microorganisms is a significant issue and is frequently reported in the news. Even foods that do not appear to be spoiled can rapidly proliferate microorganisms if the growth environment is suitable, so caution is necessary. Even if something looks clean, contamination by bacteria can progress, posing a risk of food poisoning. By ensuring hygiene management during the manufacturing process, proper storage at appropriate temperatures, and the appropriate use of the preservative polylysine, food safety can be more effectively protected. 【Features】 ■ A safe material produced through fermentation by natural microorganisms (not genetically modified organisms) ■ Provides a good image as a natural fermented product ■ Listed in the existing additive registry as a food preservative ■ A safe domestic product *Please feel free to contact us.

It has a two-port shape that makes it easy to extract contents, and the option to choose whether or not to have a nozzle!

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  • Plastic utensils and containers

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Introducing a case where a Brody Disk Mini was installed in an air transport hopper for powdered sugar with very poor fluidity!

  • Powder Supply Device
  • Powder Conveyor Device

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Introducing the otherworldly quality made possible by Oxy's technology in a video!

  • Surface treatment contract service

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Verification of increased flying distance! For any questions or requests regarding OX treatment for golf clubs, please feel free to contact us.

  • Surface treatment contract service

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Measurement of tin (II) / tin (IV) / total tin and free boron fluoride, free sulfuric acid, chlorides, free hydroxides, and carbonates in tin plating bath.

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  • Analytical Equipment and Devices
  • Non-ferrous metals
  • Plating Equipment

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The measurement of zinc and magnesium in the solution can be performed using an automatic titration device through back titration.

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  • Analytical Equipment and Devices
  • Non-ferrous metals
  • Plating Equipment

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A technical booklet that gently explains the basics of VA, CVS, and polarography, which are essential for trace metal analysis in solutions and plating solution analysis, aimed at beginners.

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  • Analytical Equipment and Devices
  • Polarograph
  • Plating Equipment

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This is the comprehensive catalog for the microporous high-performance insulation material "Silsame."

  • Industrial Furnace
  • Other energy equipment
  • Electric furnace

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ThermoTech 2026 Exhibition | Real-time comparison of energy-saving effects of high-performance insulation material "Siltharm" using an electric furnace.

Silsarm Japan will exhibit at "Thermotech 2026," which will be held at Tokyo Big Sight from September 9 (Wednesday) to September 11 (Friday), 2026. At the venue, we will showcase an electric furnace using high-performance insulation material "Silsarm" alongside a standard insulated electric furnace, demonstrating the differences in surface temperature and cumulative power consumption in real-time. In preliminary tests, we have confirmed a reduction in power consumption of over 20% and a clear decrease in surface temperature in the Siltherm furnace. On the day of the event, we will also use thermography to visually demonstrate the differences in insulation performance. ■ Event Dates: September 9 (Wednesday) to September 11 (Friday), 2026 ■ Venue: Tokyo Big Sight, South Hall ■ Booth: Hall S2 P012 We invite you to visit our booth.

Many people must be struggling with tube connections and branching methods in liquid chromatography and flow synthesis experiments. We will solve those problems!

  • Plastic utensils and containers

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A dirt-repellent coating that keeps it beautiful with just a light wipe.

  • Contract manufacturing
  • Processing Contract
  • Surface treatment contract service

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For anti-adhesion and dirt prevention.

  • Processing Contract
  • Surface treatment contract service
  • Coating Agent

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For heat management of components and temperature rise suppression.

  • Processing Contract
  • Surface treatment contract service
  • Coating Agent

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To prevent stick-slip.

  • Processing Contract
  • Surface treatment contract service
  • Contract manufacturing

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Coating film with excellent insulating properties.

  • Processing Contract
  • Surface treatment contract service
  • Coating Agent

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Coating film optimal for insulation of high-voltage components.

  • Processing Contract
  • Surface treatment contract service
  • Auto Parts

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Specialized in non-adhesiveness and release properties.

  • Processing Contract
  • Contract manufacturing
  • Surface treatment contract service

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Non-stick coating with heat resistance up to 300℃.

  • Processing Contract
  • Contract manufacturing
  • Surface treatment contract service

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Lubricating coating usable in extreme environments with no refueling, high load, and high vacuum.

  • Contract manufacturing
  • Processing Contract
  • Surface treatment contract service

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Preventing substrate issues caused by condensation, sweat, and gas.

  • Contract manufacturing
  • Processing Contract
  • Surface treatment contract service

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Narrow design suitable for limited spaces. Aluminum rolling tower with outriggers for stability.

  • Stainless steel container

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Thoroughly remove moisture from compressed air. Add filters according to the application.

  • Stainless steel container

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Easy installation just by placing it! Steel stairs for platforms. Installation with a forklift is also possible.

  • Stainless steel container

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A strong ally in improving transportation efficiency!

  • Stainless steel container

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Is there enough light on-site and at your feet?

  • Stainless steel container

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Renowned patisserie, trusted supplier. Numerous successful implementations.

  • Stainless steel container

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The M138THC-PK1612H is a portable thermal camera equipped with infrared thermography functions, housed in a compact body weighing only 168g.

  • Stainless steel container

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This is a portable industrial endoscope suitable for inspecting hard-to-see areas, such as gaps in piping and machinery/equipment.

  • Stainless steel container

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The first acoustic camera for smartphones.

  • Stainless steel container

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Conventional galvanic battery-type sensors have sometimes had a shorter lifespan than expected due to the influence of CO2 (carbon dioxide).

  • Stainless steel container

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Tabletop small-sized experimental furnace - space-saving with a maximum operating temperature of 2000℃! We also manufacture metal furnaces for reducing atmospheres.

  • Heating device
  • Electric furnace
  • Annealing furnace

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【MiniLab】 Evaporation/Sputtering Dual Chamber System

Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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☆★☆ Spatter and Vapor Deposition Source Combined Film Formation Device 【nanoPVD-ST15A】 ☆★☆

Sputter Cathode and Co-evaporation Source Mixed Thin Film Experimental Device. Metal deposition, organic deposition, and sputter cathode are installed in a compact frame. A resistance heating evaporation source (for metal deposition), an organic evaporation source (for organic materials), and magnetron sputtering (for metals and insulating materials) are installed in the chamber, allowing for various thin film experimental setups within a single chamber. ◉ Three combinations available: 1. Sputter Cathode + Resistance Heating Evaporation Source x2 2. Sputter Cathode + Organic Evaporation Source x2 3. Sputter Cathode + Resistance Heating Source x1 + Organic Evaporation Source x1 (*DC sputtering only) 【Specifications】 ◉ Compatible substrates: up to Φ4 inches ◉ Sputtering: 2" cathode x up to 3 sources ◉ Vacuum deposition: Resistance heating evaporation (up to 2), organic evaporation (up to 4) ◉ 7" touch panel operation with PLC automatic process control ◉ APC automatic pressure control ◉ 1 line of Ar gas (standard) + expandable with N2, O2 ◉ Connects to a Windows PC via USB for recipe creation and storage. Data logging on PC ◉ Various other options available ◉ Easy operation with a 7" touch panel and PLC automatic process control

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device
  • Annealing furnace
  • Electric furnace

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mid-station-linear-load-lock-1.jpg

【MiniLab】 Evaporation/Sputtering Dual Chamber System

Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)

Maximum operating temperature 2000℃ Semi-automatic control Ultra-high temperature experimental furnace (carbon furnace, tungsten metal furnace) Compact and space-saving experimental furnace

  • Heating device

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■□【PyroMini】□■ Compact High-Performance Infrared Temperature Sensor

High-performance touch panel converter for easy setup, data logging, and data storage on microSD card. The PM2.2 model can also measure glossy metal surfaces. 【Overview】 With a highly visible high-brightness touch panel display, parameters such as temperature range, emissivity, and sampling rate can be intuitively operated and set. Long-term data storage and management are possible with a microSD card. (*An option for a converter without a display is also available.) The compact sensor head, measuring φ18mm x 45mm, allows for temperature measurement in tight spaces. It employs sensors and cables with excellent noise resistance, making it suitable for integration into moving equipment such as robotic arms. The PM2.2 model uses a short wavelength of 2.2um, supporting high temperatures (Max 2000℃) and measurements of glossy metal material surfaces. 【Features】 ◎ Wide range: -20 to 1000℃ (PM), 100 to 2000℃ (PM2.2) ◎ Excellent basic performance: Accuracy ±1%, reproducibility ±0.5%, 240msec fast response ◎ Measurement wavelength range: 8 to 14μm (PM), 2.0 to 2.2μm (PM2.2) ◎ Compact Φ18mm x 45mm

6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.

  • Annealing furnace
  • Heating device
  • Electric furnace

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mid-station-linear-load-lock-1.jpg

【MiniLab】 Evaporation/Sputtering Dual Chamber System

Two thin film experimental devices are connected by a load lock mechanism. Different film deposition devices (sputtering - evaporation, etc.) are seamlessly connected via the load lock. With Moorfield's unique load lock system, connections to the process chamber on the left, right, and rear are also possible (see photo below). 1. MiniLab-E080A (Evaporation Device) - EB evaporation: 7cc crucible x 6 - Resistance heating evaporation x 2 - Organic evaporation limit x 2 2. MiniLab-S060A (Sputtering Device) - Φ2" Magnetron cathode x 4 for simultaneous sputtering - Compatible with both DC and RF power supplies 3. Load Lock Chamber - Plasma etching stage In the load lock chamber, plasma cleaning of the substrate surface is performed using the "RF/DC substrate bias stage," and the company's unique "soft etching" technology allows for a <30W low-power, damage-free plasma etching stage. This enables delicate etching processes that are prone to damage, such as 2D (removal of resists like PMMA), graphene delamination, and etching of Teflon substrates. (*This can also be installed in the main chamber stage.)

New standard model of ultrasonic cleaner equipped with communication functions to support daily management.

  • Ultrasonic Cleaner

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Industrial compact cleaning machine for manufacturing lines, equipment integration, and space-saving solutions.

  • Ultrasonic Cleaner

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A comprehensive catalog of ultrasonic equipment tailored to the needs of a wide range of industries, including semiconductors, metal processing, resin molding, and food sectors! Many products for rent...

  • Cutter/Scissors
  • Distance measuring device
  • Ultrasonic Cleaner

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Dismantling of Solar Panels - Innovative Solutions

  • Separation device
  • Solar power generator
  • Other Recycling

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Stopper for cart trolleys and similar items. With zebra markings for easy recognition, just place it for safety and peace of mind!

  • Stainless steel container

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Heat recovery type hot air drying furnace that achieves improved coating quality, energy savings, and safety.

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  • Other painting machines
  • Drying Equipment

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The grinding machine features an automatic dressing function for the grinding wheel, with a rotation speed of 800 to 1700 rpm!

  • Other physicochemical equipment

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Embedding of transparent acrylic resin is also possible! This is an embedding machine equipped with a standard water-cooled cooling mechanism.

  • Other physicochemical equipment

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