List of Heating equipment/furnace products
- classification：Heating equipment/furnace
1531～1575 item / All 4700 items
Reduce the workload from handling heavy objects! Here are five case studies that solved customer challenges! We are also accepting free consultations and tests tailored to your work!
- Other conveying machines
Strong cold wind from room temperature to -13°C! Depending on the usage environment, you can choose between the combo type or the separate type!
- Cooling system
April 10, 2024 (Wednesday) to April 12, 2024 (Friday) Notice of Participation in Nagoya Manufacturing World 2024
Sanwa Shiki Ventilator Co., Ltd. will be exhibiting at the 2024 Monozukuri World (Nagoya) held at Port Messe Nagoya. We will also be showcasing our large cooling fans and cool/warm ambient products. Date: April 10, 2024 - April 12, 2024 Opening: 10:00 AM Location: Nagoya Port Messe (Exhibition Hall 1) *Our booth: 19-1 We would be grateful if you could visit us if you have the time.
Heat treatment technology that simultaneously achieves high strength and high precision.
- Engine parts
- Heating device
- Metal bearings
Products used in high-temperature environments! Heat-resistant steel canning and welding processing!
- Industrial Furnace
This is a small-sized test rotary kiln that can fire trial materials at a small scale.
- Industrial Furnace
We propose a small batch rotary kiln capable of small lot production for various testing purposes.
- Industrial Furnace
We provide an energy-saving, high-speed enamel wire baking furnace that combines a direct combustion burner with a catalytic combustion heat recovery system.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
This equipment is a melting furnace designed for the volume reduction and harmless treatment of municipal waste incineration ash.
- Industrial Furnace
We propose a small batch furnace capable of producing small lots for various tests and materials that cannot be processed by rotary kilns.
- Industrial Furnace
It will be a high-temperature atmosphere furnace. There are achievements with temperatures up to 2,000℃.
- Industrial Furnace
Samples that require long firing times (over 4 hours) are recommended to be processed in a batch-type rotary kiln.
- Industrial Furnace
We safely remove oil, water, and contaminants from aluminum shavings (active metals), which are often involved in fire and explosion accidents, to achieve stable operations and increased added value.
- Industrial Furnace
It is a furnace for manufacturing insulation materials (rock wool) for various purposes.
- Industrial Furnace
We provide "quality improvement" and "safe melting" of briquettes for users struggling with briquette recycling.
- Industrial Furnace
We propose a high value-added and energy-saving superheated steam system compared to conventional methods (such as direct combustion types).
- Industrial Furnace
It will be a high-temperature atmosphere furnace. A crucible-type melting furnace with a lifting device can also be attached.
- Industrial Furnace
We propose equipment and systems that fuse "Tanabe's technical know-how" with "superheated steam."
- Industrial Furnace
We provide rotary kilns that enable continuous firing under an inert gas atmosphere by adopting carbon heaters and carbon retorts.
- Industrial Furnace
It is a device that controls the amount of slag discharge.
- Industrial Furnace
This is an automatic opening and closing device for the tap used during metal and slag pouring.
- Industrial Furnace
This is a device for automatically adding artificial graphite electrodes (for 10 and 12 inch use).
- Industrial Furnace
High Temp. Continuous Firing Furnace
- Ceramic Heater
Stirring and circulating hot air in the furnace with a fan to equalize the temperature distribution! Developing materials that can withstand ultra-high temperatures.
- fan
- Industrial Furnace
50V specification, achieving rapid heating in 15 seconds! Contributes to significant reduction in work cycle and improvement in productivity.
- Other heaters
Radiation panel, heat source with long lifespan! Far infrared heaters that create new energy.
- Other heaters
Rapid heating and cooling in 30 seconds is possible! Quick temperature rise even with far infrared.
- Other heaters
Compact, low-cost, and highly versatile! It features an upper and lower heater system that delivers excellent work efficiency.
- Other heaters
Supports heating and curing of resins and plastics! Inline compatible with the adoption of a network conveyor system.
- Heating device
Supports a maximum operating temperature of 280°C! Oven with an internal cleanliness class of 100.
- Heating device
Processing time and processing conditions can be easily changed using the touch panel!
- Heating device
A new steam convection oven that guarantees excellent uniformity even under maximum load!
- Heating device
We will widely accommodate the creation of a variety of steamed products!
- Heating device
New power module equipped with SiC MOSFET - EKOHEAT2
- Heating device
Strong in handling large items with well-equipped facilities such as large heat treatment furnaces and large shot blasting machines.
- Heating device
- Painting Machine
- Processing Contract
Years of proven results! Ideal for drying processes in precision equipment manufacturing and coating.
- Heating device
A ceramic heater created from years of experience! Achieving high emissivity far-infrared radiation.
- Heating device
It is a high-performance vacuum deposition source that can be used as a high-temperature heating cell for vacuum applications, with an organic deposition source up to 800°C and a metal deposition sour...
- Evaporation Equipment
- Heating device
- Electric furnace
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
6 to 8 inch ultra-high temperature wafer annealing equipment, a high-performance machine that widely supports various purposes from research and development to small-scale production.
- Annealing furnace
- Heating device
- Electric furnace
Multi-Target Sputtering Device [MiniLab-125] Compatible with Φ8" SiC Coating Equipped with 1000℃ Heater Stage! Compact Size!
Multifunctional Multi-Sputtering Device (Compatible with Φ8inch Substrates) - Simultaneous deposition of three components + one component Pulse DC sputtering - Flexible arrangement of RF500W and DC850W power supplies to three cathodes (Source 1, 2, 3) - Equipped with a 5KW Pulse DC power supply → used with dedicated cathode (4) - Substrate heating stage Max 800℃ (SiC coated heater can achieve Max 1000℃) - MFC x 3 systems (Ar, O2, N2) for reactive sputtering - Main chamber RIE etching stage RF300W - LL chamber <30W low power controlled soft etching - Unique "Soft-Etching" technology reduces substrate damage through substrate bias - Touch panel or Windows PC operation: All operations can be performed on the touch panel/PC without dispersing control. - Equipment installation dimensions: 1,960(W) x 1,100(D) x 1,700(H) mm - Multi-chamber type can also be manufactured. ● Mixed specifications for resistance heating deposition, organic material deposition, EB deposition, PECVD, etc. are also possible.
Vacuum Ultra-High Temperature Cylindrical Heater Unit Maximum Temperature 1800°C (Graphite, C/C Composite)
- Ceramic Heater
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
High-temperature crucible heating heater for vacuum use. A versatile heater unit that can be used as an organic deposition source at 800°C and a metal deposition source at 1500°C.
- Evaporation Equipment
- Heating device
- Electric furnace
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
This is a heater for thin film experiments such as PVD and CVD, featuring excellent uniformity, heating characteristics, and controllability. RF/DC bias specifications are also available.
- Heating device
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.
![[Nanofurnace] BWS-NANO Thermal CVD ...](https://image.mono.ipros.com/public/product/image/0d0/2000191194/IPROS99314670218218380543.jpeg?w=280&h=280){kind=small}
Hot Wall Type Thermal CVD Equipment: A compact, high-performance CVD device ideal for fundamental research.
- CVD Equipment
- Annealing furnace
- Heating device
BH Series [UHV Compatible Ultra-High Temperature Vacuum Thin Film Experiment Substrate Heater] Max 1800℃
It can be applied to various vacuum thin film experiments such as PVD (sputtering, evaporation, EB, etc.), CVD, high-temperature vacuum annealing, and high-temperature sample analysis substrate stages. We offer custom-made solutions to meet various specifications. 【Features】 ● Semi-custom product. Designed and manufactured according to your requests. ● Easy replacement of the auxiliary heater wire. ● Easy installation and maintenance (M6 stud bolts, supports). ● Compatible with RF/DC bias and substrate rotation. 【Standard Accessories】 ● Thermocouple: wire type with alumina insulating sleeve. ● Mounting stud bolts. 【Options】 ● RF (150W)/DC (1KW) bias application. ● Non-standard heater wires (Nb, Mo, Pt/Re, WRe, etc.). ● Substrate holding clips. ● Mounting brackets. ● Substrate holders. ● Tapped holes for holder installation. ● Change of top plate material (PBN, quartz, carbon, Inconel, etc.). ● Additional thermocouples for overheating. ● Base flange and vacuum feedthrough.