We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for ALD Equipment.
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ALD Equipment Product List and Ranking from 8 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

ALD Equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. ハイテック・システムズ Kanagawa//Industrial Machinery
  2. Creative Coatings Co., Ltd. Tokyo//Electronic Components and Semiconductors
  3. マツボー Tokyo//Trading company/Wholesale
  4. 4 ティー・ケイ・エス Tokyo//Electronic Components and Semiconductors
  5. 5 Beneq Kanagawa//Industrial Machinery
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ALD Equipment Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. Ultra-low temperature ALD device CMVA-1000 for TGV (maximum 600 corners) Creative Coatings Co., Ltd.
  2. Particle ALD (Atomic Layer Deposition) device / FORGE NANO Inc. マツボー
  3. Thermal ALD equipment "Savannah G2" ハイテック・システムズ
  4. 4 High-speed film-forming ALD device 'FHR.STAR-400x300SALD' ティー・ケイ・エス
  5. 5 Large substrate ALD device ハイテック・システムズ

ALD Equipment Product List

16～17 item / All 17 items

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[English Market Research Report] Global Market for ALD Equipment

[English Market Research Report] Global Market for ALD Equipment

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The global market size for ALD equipment is expected to reach 3.9 billion USD in 2023 and 6.2 billion USD by 2028, with a projected CAGR of 10.0% from 2023 to 2028. This report investigates and analyzes the global ALD equipment market, providing information on key driving and restraining factors, competitive landscape, and future trends.

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Particle ALD (Atomic Layer Deposition) device / FORGE NANO Inc.

Particle ALD (Atomic Layer Deposition) device / FORGE NANO Inc.

ALD (Atomic Layer Deposition) equipment dedicated to particles can deposit films on nanoscale particles.

The particle ALD (Atomic Layer Deposition) system for research and development can be utilized for various development purposes. It is capable of processing film formation on nanoscale particles from milligrams to kilograms. - Uniform control of film thickness using methods including fluidized beds - Three sizes of reactors with different capacities - Individual temperature control for multiple precursors - Ability to deposit various films on diverse particle materials - Easy creation of custom recipes and automated operation - Removable particle containers * There is also a lineup of equipment for mass production.

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