DLI-CVD/DLI-ALD device "MC-100/MC-200"
The maximum film-forming temperature is 800°C! It can accommodate up to 4x DLI evaporators with the chamber heating mechanism.
The "MC-100/MC-200" is a DLI-CVD/DLI-ALD system with a stainless steel chamber. It supports substrates up to 200mm in diameter, with a maximum of 8 mass flow controllers for the "MC-100" and 6 for the "MC-200," and it can be equipped with a turbo pump. Please feel free to consult us when you need assistance. 【Features】 ■ Supports substrates up to 200mm in diameter ■ Maximum film deposition temperature: 800℃ ■ Capable of accommodating up to 4x DLI evaporators ■ Mass flow controllers: up to 8 ■ Stainless steel chamber *For more details, please refer to the PDF document or feel free to contact us.
- Company：ハイテック・システムズ
- Price：Other
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