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Etcher Product List

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ME-5000 Sheet-Type Spin Etcher

It is a sheet-type spin etcher compatible with 300mm wafers and double-sided processing!

The "ME-5000" is a single-wafer spin etcher compatible with 300mm/8.6.4 inch silicon wafers, as well as 8.6.4 inch SiC and GaN wafers, featuring a mechanical grip. The etching chamber has a movable upper and lower mechanism, allowing for rotation and vertical movement with two arms. An airflow is created inside the cleaning cover, and the chemicals are separated and recovered using five types: four types of acid-based solutions and pure water. For more details, please contact us or download the catalog.

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We have started renting out the Plasma Etcher [RIE.S-200A]~♪

High etching effect regardless of organic or inorganic! Rental starts from one week♪ Easy to use with touch panel control.

Contract etching of Si and carbon films! In addition, it can be used for various applications such as the fabrication of fine circuits like semiconductor integrated circuits. Available for rental for one week or more to support research and development quickly! Initial condition proposals and demo processing are provided free of charge.

  • Etching Equipment
  • Etcher

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Plasma Etcher【CPE.S-200A】

High etching effect regardless of organic or inorganic!

Etching of Si and carbon films! Additionally, it can be used for various applications such as the fabrication of semiconductor integrated circuits and other fine circuits♪

  • Etching Equipment
  • Other semiconductor manufacturing equipment
  • Etcher

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Plasma Etcher Semi-Auto Series [CPE-300S]

A cost-effective version of a user-friendly vacuum plasma device! For Teflon hydrophilization and water repellency of various materials.

A new lineup of the user-friendly tabletop vacuum plasma device "Plasma Etcher" series has been introduced, featuring a semi-automatic type! It has been further miniaturized and can be installed in a space-saving manner. It is now even easier to use with both automatic and manual functions. Manual operation can be performed via a touch panel, and you can also set recipes in advance for one-button easy operation. The stage size can be freely selected from φ100mm to φ1000mm. In addition to general hydrophilization and adhesion enhancement of ceramics, metals, and resins, it can also be used for processing PTFE (Teflon), water-repellent treatment of various materials, etching, and thin film formation. Custom orders for options such as cooling mechanisms and additional gas systems are also accepted.

  • Plasma Generator
  • Plasma surface treatment equipment
  • Etcher

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[Research Material] Global Market for Wafer Etchers

World Market for Wafer Etchers: Dry Etchers, Wet Etchers, Logic & Memory, MEMS, Power Devices, Others

This research report (Global Wafer Etcher Market) investigates and analyzes the current state of the global wafer etcher market and its outlook for the next five years. It includes information on the overview of the global wafer etcher market, trends of major companies (sales, selling prices, market share), market size by segment, market size by major regions, and distribution channel analysis. The segments by type in the wafer etcher market focus on dry etchers and wet etchers, while the segments by application target logic/memory, MEMS, power devices, and others. The regional segments calculate the market size of wafer etchers by dividing them into North America, the United States, Europe, Asia-Pacific, Japan, China, India, South Korea, Southeast Asia, South America, the Middle East, and Africa. It also includes the market share of major companies in the wafer etcher market, product and business overviews, and sales performance.

  • Other services
  • Etcher

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