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Monitor×アルバック／ULVAC, Inc. - List of Manufacturers, Suppliers, Companies and Products

Monitor Product List

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High Performance Process Gas Monitor Qulee HGM Series

High Performance Process Gas Monitor Qulee HGM Series

Meeting all needs from various research and development applications to process management of vacuum equipment【ULVAC】.

Introducing the high-end model of ULVAC's new residual gas analyzer Qulee series, the "Qulee HGM," which achieves revolutionary simplicity and ease of use. It realizes a high sensitivity of 2.5 × 10-6A/Pa (Faraday cup), catering to all needs from various research and development applications to process management in vacuum equipment. 【Specifications】 ○ Power supply voltage: DC24V ±10% 50W ○ Weight (sensor unit/analysis tube): 2.4kg/0.81kg ○ Operating temperature range: 10 to 40℃ ○ Operating humidity range: 15 to 80% (no condensation) ○ IP protection rating: IP30 (sensor unit) For more details, please contact us or download the catalog.

  • Other measurement, recording and measuring instruments
  • Analytical Equipment and Devices

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Basic Process Gas Monitor Qulee BGM Series

Basic Process Gas Monitor Qulee BGM Series

It is ideal for equipment management of vacuum deposition devices and various vacuum furnaces. [ULVAC]

This is ULVAC's new residual gas analyzer, realized with revolutionary simplicity and ease of use. It marks the arrival of a new standard in process monitoring, shaped by the voices of equipment technology professionals from various production lines. It is ideal for managing vacuum deposition systems and various vacuum furnaces. 【Features】 - Integrated display design... Measurement possible without a computer - Easy operation - One Click function... Simple for anyone. No complex operations required - Enhanced leak test functionality - Capable of total pressure measurement - Qulee QCS software is standard For more details, please contact us or download the catalog.

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Reactive Process Gas Monitor Qulee RGM-202/302

Reactive Process Gas Monitor Qulee RGM-202/302

Process monitor with differential exhaust system compatible with reactive processes such as etching and CVD [ULVAC].

The Qulee RGM-202/RGM-302 is a process monitor equipped with a differential exhaust system that supports reactive processes such as etching and CVD in the Qulee series. Thanks to ULVAC's unique ion source and exhaust system structure, it offers excellent corrosion resistance to reactive gases and enables stable measurements over long periods. 【Specifications】 ○ Mass: Exhaust system: 57 kg / Control system: 38 kg ○ Power supply voltage: AC100V 15A ○ Compressed air: Dry N2: 0.4 to 0.7 MPa (φ6 quick connector) ○ One Click function: Yes / He/H2O/N2/O2/Any gas ○ PC interface: RS-232C/485 For more details, please contact us or download the catalog.

  • Analytical Equipment and Devices
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Optical Process Monitor Optius

Optical Process Monitor Optius

You can monitor the status of various plasma processes in real time. 【ULVAC】

The optical process monitor Optius can monitor the status of various plasma processes in real-time by measuring the emission spectrum of the plasma. It is ideal for MFC control in reactive sputtering and endpoint detection in etching. 【Specifications】 ○ Weight: Main unit (TSC): 4.9kg Expansion unit (ESC, 1ch): 1.3kg ○ Power supply: AC100–240V (50/60Hz) ○ Power consumption: 100W (when using 5 channels) ○ Operating environment: Temperature: 10 – 40°C, Humidity: 15 – 80% RH (without condensation) For more details, please contact us or download the catalog.

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  • Other process controls

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Compact Process Gas Monitor Qulee CGM Series

Compact Process Gas Monitor Qulee CGM Series

Achieving high precision and high resolution under high pressure with revolutionary simplicity and ease of use【ULVAC】.

The Qulee CGM series is a new type of residual gas analyzer/process gas monitor from ULVAC that achieves high precision and high resolution under high pressure (below 1 Pa) with revolutionary simplicity and ease of use. It represents the new standard for process monitors shaped by the voices of equipment technology professionals in various production lines. It is ideal for process management in sputtering equipment (improving quality and yield). 【Specifications】 ○ Mass separation method: Quadrupole mass spectrometer ○ Mass range: 1 to 50 amu ○ Resolution: M/ΔM = 1M (10% P.H.) ○ Maximum operating pressure: 2 Pa (FC) 1×10⁻² Pa (SEM) ○ Linearity: 1 Pa For more details, please contact us or download the catalog.

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