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It is an autofocus microscope for single-object use. With the focus stage included, it can be easily attached to the device to become an AF microscope.
Features 1. It is a V-type that can be integrated into various optical systems. 2. It automatically controls focus with a focusing accuracy of less than 1μ.
AF device for high-resolution microscope inspection of wafer chip patterns.
This is an AF device for high-resolution microscope inspection of wafer chip patterns. Even when the workpiece is moved using an electric XY stage, pattern matching inspection can always be performed with a focused image. It also has a function for auto-review image files of sample height at the optimal magnification for inspection, controlled by coordinates from file data. After inspection, a macro MAP can be displayed to confirm defect locations.
You can perform inspections in IR bright field and dark field using adjustments to infrared light illumination.
Non-destructive monitoring and inspection of internal defects in infrared-transmitting materials such as semiconductor wafers can be performed simultaneously with visible and infrared images, allowing for the detection of pattern misalignment and internal defects. The surfaces of TSV through-silicon vias and stacked wafers can be monitored simultaneously with visible imaging and IR focus adjustment to observe the interior of the wafers. For more details, please download and view the catalog.
A testing machine capable of visual inspection and monitor inspection that reads FPD panels at increments of 1μm.
This is a microscope for inspecting FPD panels. You can place the panel on a glass stage and slide it in the XY direction using a hand handle, and position it precisely with a fine adjustment handle. The movement can be read in 1μm increments using a digital counter, allowing for visual inspection and monitor inspection, and inspection images can be saved as files. For more details, please download and view the catalog.
The movement amount is displayed on a digital counter using a microscope that inspects large glass substrates. There are manual and electric types available.
This is an inspection microscope for inspecting large substrates. Large substrates can be placed on the stage and moved for microscope inspection. The movement amount is displayed on a digital counter, allowing for line width and position measurements. The manual type features a half-nut mechanism for free movement and a handle for fine adjustment. The electric type can be remotely operated with stepping drive. For more details, please download the catalog or contact us.
Ultraviolet light inspection can be performed in a microscopic area.
The micro spot exposure microscope is a high-precision review inspection microscope for mask defects that can perform slit exposure on small areas of the screen. It places a mask coated with resist on a stage, automatically reproduces the defect positions from the defect inspection machine's data, determines the exposure range with an XY slit, and uses a timer to expose with a mercury spectrum in a spot irradiation microscope. For more details, please download and view the catalog.
Panels up to 60" can be inspected for clear field transmission, reflection, and differential interference using an electric revolver and autofocus for focused image inspection.
This is a length measurement microscope that inspects module products up to 60 inches. With an extended optical tube, visual inspection and monitor inspection can be performed at hand. As it is a fixed-type microscope, visual inspection and monitor inspection can be conducted with the extended optical tube, and automatic measurement can be performed in conjunction with the stage movement. For more details, please download the catalog or contact us.
A microscope that superimposes images of both sides of the specimen within the field of view and compares the amount of displacement, which can be measured using a measuring system.
This is a microscope that overlays images of both sides of the specimen within the field of view and compares the amount of displacement for observation, allowing measurement with a measuring system. The objective lenses come in five types, with magnifications ranging from 50x to 1000x, accommodating a wide variety of samples. It features NIR visible/infrared transmission type. There is also a camera position synthesis device available. For more details, please download the catalog or contact us.
