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Grid Ion Source Specification Details

Grid Ion Source Specification Details

We are publishing the specifications of various grid ion sources manufactured by Kaufman & Robinson.

At OSI Industry, we handle various grid ion sources manufactured by Kaufman & Robinson. We have detailed specifications for each type of grid ion source, so please take this opportunity to have a look. 【Contents Listed】 ● Discharge / Discharge Current / Discharge Power ● Grid ● Beam Type ● Gas Flow Rate ● Gas ● Pressure ● Ion Gun Height / Ion Gun Diameter ● Neutralizer For more details, please download the catalog or contact us.

  • Other semiconductor manufacturing equipment

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Kaufman Gridless (End-Hole Type) Ion Source

Kaufman Gridless (End-Hole Type) Ion Source

Cafmangridless ion source set

For more details, please contact us or download the catalog. *This catalog is in English.

  • Evaporation Equipment
  • Etching Equipment
  • Plasma surface treatment equipment

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Kaufman Grid Type Ion Source

Kaufman Grid Type Ion Source

The KRI grid ion source is available in DC type and RF type.

Kaufman-type gridded ion gun RFICP ion source grid sizes: 4cm, 10cm, 14cm, 22cm, 36cm DC ion source grid sizes: 1cm, 4cm, 8cm, 10cm, 16cm The versatile gridded series of broad beam ion sources are available in different sizes which cover both R&D and high yield production requirements. Large ion beam sources meet critical output performance for uniform coverage over wide process zones. For more details, please contact us or download the catalog. *This catalog is in English.

  • Evaporation Equipment
  • Other semiconductor manufacturing equipment
  • Etching Equipment

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