The KRI grid ion source is available in DC type and RF type.
Kaufman-type gridded ion gun RFICP ion source grid sizes: 4cm, 10cm, 14cm, 22cm, 36cm DC ion source grid sizes: 1cm, 4cm, 8cm, 10cm, 16cm The versatile gridded series of broad beam ion sources are available in different sizes which cover both R&D and high yield production requirements. Large ion beam sources meet critical output performance for uniform coverage over wide process zones. For more details, please contact us or download the catalog. *This catalog is in English.
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basic information
【Features】 ○OptiBeamTM self-aligning optics ○Controlled neutralization ○Plasma discharge ○Modular architecture ○Inert, reactive and organic gases ○Collimated, divergent, and convergent beams ●For more details, please contact us or download the catalog. *This catalog is in English.
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For more details, please contact us or download the catalog. *This catalog is in English.
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Company information
Our company started in 1988 as an overseas export trading company for vacuum thin film manufacturing equipment, and has expanded its operations as a "total planner of vacuum technology" up to the present day. During this time, we have focused on the development of optical thin film materials, as well as the sales of ion beam processes and refrigeration units (Sapcold). Additionally, we have developed and are set to launch the GCIB (Gas Cluster Ion Beam) process equipment, which is expected to be an important technology in the next generation of nano-processing. Starting with glasses and camera lenses, we now see new media continuously emerging in the optical-related industry, including digital cameras, mobile phones, and medical lenses.