Photoelectron Spectrometer - メーカー・企業8社の製品一覧とランキング

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サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K. Tokyo//Testing, Analysis and Measurement
アズサイエンス松本本社 Nagano//Trading company/Wholesale
一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
4 シエンタオミクロン Tokyo//Testing, Analysis and Measurement
5 理研計器本社 Tokyo//Machine elements and parts

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Photoelectron Spectrometerの製品ランキング

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X-ray photoelectron spectroscopy device 'Nexsa' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
JPS-9030 Photoelectron Spectroscopy Device (XPS) アズサイエンス松本本社
Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
4 [UPS] Ultraviolet Photoelectron Spectroscopy 一般財団法人材料科学技術振興財団　MST
5 [XPS] X-ray Photoelectron Spectroscopy 一般財団法人材料科学技術振興財団　MST

Photoelectron Spectrometerの製品一覧

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Evaluation of surface oxide film thickness using photoelectron spectroscopy.

Calculate the oxide film thickness of the SiO2 surface oxide film on the Si substrate using photoelectron spectroscopy!

In the process of forming an oxide film, controlling the thickness of the oxide film is one of the very important factors. Therefore, we estimated the thickness of the surface oxide film non-destructively using photoelectron spectroscopy. In samples covered with a thin oxide film, many elemental photoelectron peaks show a two-peak structure corresponding to the oxide component and the substrate component. By measuring the spectral intensity of each component, we can estimate the thickness of the oxide film. There are several analytical methods to determine film thickness non-destructively, but compared to other methods, the ability to estimate the thickness at specific locations is a characteristic of this method. *For more detailed information, please refer to the attached PDF document. For further inquiries, feel free to contact us.*

企業：東芝ナノアナリシス
価格：Other

Other analysis and evaluation services

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X-ray photoelectron spectroscopy (XPS)

By measuring the energy and intensity of photoelectrons, it is possible to identify and quantify atoms!

"X-ray photoelectron spectroscopy (XPS)" is a surface analysis technique that allows for the compositional analysis of ultra-thin surfaces at the nanometer level. It is also capable of evaluating the electronic states (chemical bonding, valence, hybridization, electron correlation) of each element that makes up the material, and by using a neutralization gun, it can measure the surfaces of insulators as well, making it widely used for the analysis of various material surfaces. Please feel free to contact us when you need assistance. 【Features】 ■ Compositional analysis of the topmost surface at the nanometer level (Li and above) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred µm in diameter * For more details, please download the PDF or feel free to contact us.

企業：東芝ナノアナリシス
価格：Other

Contract Analysis

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X-ray photoelectron spectroscopy (XPS)

We support your material evaluation by assessing the outermost surface of the material using XPS (X-ray photoelectron spectroscopy).

X-ray photoelectron spectroscopy (XPS) is an essential tool in the development and quality control across various fields. Please utilize XPS for improving the performance of your products, investigating the causes of defects, and developing next-generation materials. XPS can clarify the following information by irradiating the sample's outer surface (a few nm) with X-rays and precisely analyzing the energy of the emitted photoelectrons: (1) Identification of constituent elements: A wide range of elements can be analyzed, from lithium (Li) to uranium (U). (2) Depth profiling: By combining with argon sputtering, it is possible to evaluate the elemental composition in the depth direction from the surface. This is effective for assessing film thickness and interface analysis. (3) Atmosphere-free analysis: Using special equipment, samples can be analyzed without exposure to the atmosphere. This prevents surface contamination or alteration due to atmospheric components, allowing for the acquisition of true surface information. (4) Measurement of insulators: Analysis of a wide variety of materials is possible.

企業：大同分析リサーチ
価格：Other

Contract Analysis

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Hard X-ray Photoelectron Spectroscopy

HAXPES is an analytical method that uses hard X-rays as the excitation light for XPS (X-ray photoelectron spectroscopy).

It is also referred to as HX-PES or HXPES. Due to high-energy X-ray excitation, it allows for bulk state evaluation up to approximately 50 nm deep, which is several to about 10 times deeper than conventional XPS, as well as damage-free evaluation of bonding states at interfaces. This device is a laboratory instrument equipped with a GaKα source (9.25 keV), which enables a reduction in the time lag from sample preparation to measurement. - Bulk-sensitive state evaluation (approximately up to 50 nm) - Non-destructive evaluation of buried interface bonding states - Evaluation using deep inner shell orbitals (avoiding overlapping Auger peaks in XPS, analysis using the non-split 1s orbital) It also includes options for measurements combined with sputtering using GCIB (Gas Cluster Ion Beam), angle-resolved measurements, Al source (1.49 keV), neutralization guns, and measurements under non-exposure to the atmosphere. - Damage-free sputter cleaning using GCIB (depth profiling is generally not possible) - Depth-direction comparison of bonding states using Al source and angle-resolved measurements - Evaluation under non-exposure to the atmosphere

企業：一般財団法人材料科学技術振興財団　MST
価格：Other

Contract measurement

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[Analysis Case] Chemical State Analysis of Metal Elements on the Sample Surface Due to Heating

This is an example of evaluating the changes in the chemical state of metal elements due to heating two types of metal foils within an XPS device.

**Analysis Samples** (1) Cu Foil: The Cu foil, which was discolored by heating in the atmosphere, was used for analysis. (2) Ag Foil: The Ag foil, which was discolored due to atmospheric corrosion, was used for analysis. **Analysis Method** XPS Analysis XPS; monochromatic AlKα radiation (ULVAC-PHI model PHI5000 VersaProbe II) Each sample was measured at room temperature and then heated to 500°C in the device (under vacuum) and measured again after heating. **Summary** By conducting XPS analysis, it is possible to evaluate the changes in chemical state associated with the temperature rise of the samples under vacuum. Additionally, the X-ray photoelectron spectroscopy (XPS) equipment owned by Kaneka Techno Research can perform XPS measurements both before and after heating, as well as during heating. Therefore, if the reaction rate is slow, it is also possible to evaluate how the chemical state changes over time.

企業：カネカテクノリサーチ本社、東京営業所、名古屋営業所、大阪分析センター、高砂分析センター
価格：Other

Contract measurement

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Application of XPS analysis to tablets

You can obtain information about the chemical composition, bonding state, and valence of the outermost surface!

We would like to introduce the application of XPS analysis to tablets. X-ray photoelectron spectroscopy (XPS) is an analytical method that observes electrons emitted when X-rays are irradiated onto a sample, allowing us to extract information about the electrons present within the sample. This technique provides information on the chemical composition, bonding states, and valence of the surface. Please feel free to contact us if you have any inquiries. 【Features】 ■ Composition analysis of the topmost surface at a few nm (Li～) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred μm in diameter *For more details, please download the PDF or feel free to contact us.

企業：東芝ナノアナリシス
価格：Other

Other analysis and evaluation services

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XPS analysis of discolored copper material surface

In the investigation of the discoloration of metal components, qualitative analysis of the surface condition and evaluation using XPS of the thickness and depth distribution of the surface oxide film are very effective!

We would like to introduce the XPS analysis of the discolored copper material surface. The causes of copper discoloration can be due to the formation of corrosion products, as well as differences in the thickness of the surface oxide film (resulting in color changes due to light interference phenomena). Therefore, in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS), conducting depth profile analysis is also effective. In the attached PDF document, we present a case study where qualitative surface analysis and depth profile analysis of the copper material were conducted, comparing the discolored areas with the normal areas. Please take a look. [Evaluation of Copper Surface Discoloration] ■ Conducting depth profile analysis in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS) is effective. *For more details, please download the PDF or feel free to contact us.

企業：東芝ナノアナリシス
価格：Other

Other analysis and evaluation services

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