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Photoelectron Spectrometer Product List and Ranking from 9 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

Photoelectron Spectrometer Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. 一般財団法人材料科学技術振興財団　MST Tokyo//Testing, Analysis and Measurement
  2. シエンタ オミクロン Tokyo//Testing, Analysis and Measurement
  3. アズサイエンス 松本本社 Nagano//Trading company/Wholesale
  4. 4 サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K. Tokyo//Testing, Analysis and Measurement
  5. 5 カネカテクノリサーチ 本社、東京営業所、名古屋営業所、大阪分析センター、高砂分析センター Osaka//Testing, Analysis and Measurement
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Photoelectron Spectrometer Product ranking

Last Updated： Aggregation Period:Oct 15, 2025～Nov 11, 2025
This ranking is based on the number of page views on our site.

  1. JPS-9030 Photoelectron Spectroscopy Device (XPS) アズサイエンス 松本本社
  2. Fully Automated X-ray Photoelectron Spectroscopy Device 'K-Alpha' サーモフィッシャーサイエンティフィック株式会社／Thermo Fisher Scientific K.K.
  3. [UPS] Ultraviolet Photoelectron Spectroscopy 一般財団法人材料科学技術振興財団　MST
  4. 4 HAXPES-Lab (Laboratory-type Hard X-ray Photoelectron Spectroscopy Analysis System) シエンタ オミクロン
  5. 4 ARPES-Lab (Angle-Resolved Photoemission Spectroscopy Analysis System) シエンタ オミクロン

Photoelectron Spectrometer Product List

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X-ray photoelectron spectroscopy (XPS)

X-ray photoelectron spectroscopy (XPS)

By measuring the energy and intensity of photoelectrons, it is possible to identify and quantify atoms!

"X-ray photoelectron spectroscopy (XPS)" is a surface analysis technique that allows for the compositional analysis of ultra-thin surfaces at the nanometer level. It is also capable of evaluating the electronic states (chemical bonding, valence, hybridization, electron correlation) of each element that makes up the material, and by using a neutralization gun, it can measure the surfaces of insulators as well, making it widely used for the analysis of various material surfaces. Please feel free to contact us when you need assistance. 【Features】 ■ Compositional analysis of the topmost surface at the nanometer level (Li and above) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred µm in diameter * For more details, please download the PDF or feel free to contact us.

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X-ray photoelectron spectroscopy (XPS)

X-ray photoelectron spectroscopy (XPS)

We support your material evaluation by assessing the outermost surface of the material using XPS (X-ray photoelectron spectroscopy).

X-ray photoelectron spectroscopy (XPS) is an essential tool in the development and quality control across various fields. Please utilize XPS for improving the performance of your products, investigating the causes of defects, and developing next-generation materials. XPS can clarify the following information by irradiating the sample's outer surface (a few nm) with X-rays and precisely analyzing the energy of the emitted photoelectrons: (1) Identification of constituent elements: A wide range of elements can be analyzed, from lithium (Li) to uranium (U). (2) Depth profiling: By combining with argon sputtering, it is possible to evaluate the elemental composition in the depth direction from the surface. This is effective for assessing film thickness and interface analysis. (3) Atmosphere-free analysis: Using special equipment, samples can be analyzed without exposure to the atmosphere. This prevents surface contamination or alteration due to atmospheric components, allowing for the acquisition of true surface information. (4) Measurement of insulators: Analysis of a wide variety of materials is possible.

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[Analysis Case] Band Gap Evaluation of Oxidized and Nitrided Thin Films

[Analysis Case] Band Gap Evaluation of Oxidized and Nitrided Thin Films

High-precision band gap evaluation is possible through combined analysis of XAFS and XPS.

The band gap of thin film samples has been measured using analytical methods such as UV-Vis, PL, and XPS, but the cases that could be evaluated were limited due to constraints related to the sample structure, such as materials, film thickness, and substrates. This time, through the combined analysis of XAFS and XPS, it has become possible to reduce the constraints of the sample structure and achieve a higher precision band gap evaluation than before. This method is particularly effective for the evaluation of various oxide and nitride films. This document presents a case study on the band gap evaluation of silicon nitride (SiN) films. Measurement methods: XAFS, XPS. Product fields: solar cells, lighting, oxide semiconductors, power devices. Analysis purpose: evaluation of electronic states. For more details, please download the document or contact us.

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The influence of adsorbed oxygen in XPS.

The influence of adsorbed oxygen in XPS.

XPS: X-ray Photoelectron Spectroscopy

XPS is a method for obtaining information about the composition and bonding state of the sample surface (to a depth of about several nanometers), but by combining it with ion irradiation for sputter etching, it is also possible to evaluate the internal structure of the sample and depth distribution. However, in evaluations involving sputter etching, due to the principles and measurement mechanisms of XPS, the amount of oxygen may be overestimated due to the influence of adsorbed oxygen, so caution is required. In the case of evaluating samples that easily adsorb oxygen (such as Ti, TiN, AlN, etc.) or focusing on trace amounts of oxygen, the influence of adsorbed oxygen becomes significant, so comparisons between samples and analyses using SIMS are recommended.

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[Analysis Case] Verification of Reduction Treatment for Sn Oxide

[Analysis Case] Verification of Reduction Treatment for Sn Oxide

Comparison of XPS and computational simulations: Analysis of electronic states from the valence band spectrum.

XPS is a method for evaluating the composition and bonding state of a material based on the photoelectron spectrum from inner shell levels. On the other hand, the valence band spectrum, which reflects the states of the outer shell electrons, appears near the Fermi level. This document presents a case study that verifies the reduction treatment of Sn oxides by comparing and discussing the density of states calculated through first-principles calculations with the valence band spectrum obtained by XPS. Utilizing computational simulations allows for a deeper understanding of the XPS spectrum obtained.

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Hard X-ray Photoelectron Spectroscopy

Hard X-ray Photoelectron Spectroscopy

HAXPES is an analytical method that uses hard X-rays as the excitation light for XPS (X-ray photoelectron spectroscopy).

It is also referred to as HX-PES or HXPES. Due to high-energy X-ray excitation, it allows for bulk state evaluation up to approximately 50 nm deep, which is several to about 10 times deeper than conventional XPS, as well as damage-free evaluation of bonding states at interfaces. This device is a laboratory instrument equipped with a GaKα source (9.25 keV), which enables a reduction in the time lag from sample preparation to measurement. - Bulk-sensitive state evaluation (approximately up to 50 nm) - Non-destructive evaluation of buried interface bonding states - Evaluation using deep inner shell orbitals (avoiding overlapping Auger peaks in XPS, analysis using the non-split 1s orbital) It also includes options for measurements combined with sputtering using GCIB (Gas Cluster Ion Beam), angle-resolved measurements, Al source (1.49 keV), neutralization guns, and measurements under non-exposure to the atmosphere. - Damage-free sputter cleaning using GCIB (depth profiling is generally not possible) - Depth-direction comparison of bonding states using Al source and angle-resolved measurements - Evaluation under non-exposure to the atmosphere

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[Analysis Case] Chemical State Analysis of Metal Elements on the Sample Surface Due to Heating

[Analysis Case] Chemical State Analysis of Metal Elements on the Sample Surface Due to Heating

This is an example of evaluating the changes in the chemical state of metal elements due to heating two types of metal foils within an XPS device.

**Analysis Samples** (1) Cu Foil: The Cu foil, which was discolored by heating in the atmosphere, was used for analysis. (2) Ag Foil: The Ag foil, which was discolored due to atmospheric corrosion, was used for analysis. **Analysis Method** XPS Analysis XPS; monochromatic AlKα radiation (ULVAC-PHI model PHI5000 VersaProbe II) Each sample was measured at room temperature and then heated to 500°C in the device (under vacuum) and measured again after heating. **Summary** By conducting XPS analysis, it is possible to evaluate the changes in chemical state associated with the temperature rise of the samples under vacuum. Additionally, the X-ray photoelectron spectroscopy (XPS) equipment owned by Kaneka Techno Research can perform XPS measurements both before and after heating, as well as during heating. Therefore, if the reaction rate is slow, it is also possible to evaluate how the chemical state changes over time.

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Atmospheric Photoelectron Spectrometer "AC-3"

Atmospheric Photoelectron Spectrometer "AC-3"

A photoelectron spectroscopy device capable of measuring photoelectrons in the far ultraviolet region (4.00-7.00 eV) in the atmosphere.

The "AC-3" is an atmospheric photoelectron spectroscopy device that allows for easy measurement of the density of states near the highest occupied orbital, work function, and ionization potential in the atmosphere. It can also measure information about the nanoscale surface and the thickness of ultra-thin films (0-20nm). 【Features】 ■ Can measure powdered or liquid samples that cannot be brought into a vacuum ■ Measurement time is only about 5 minutes ■ Easy measurement of ionization potential in the atmosphere ■ Capable of measuring film thickness (0-20nm) *For more details, please download the PDF or contact us.

  • Analytical Equipment and Devices
  • Spectroscopic Analysis Equipment

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Application of XPS analysis to tablets

Application of XPS analysis to tablets

You can obtain information about the chemical composition, bonding state, and valence of the outermost surface!

We would like to introduce the application of XPS analysis to tablets. X-ray photoelectron spectroscopy (XPS) is an analytical method that observes electrons emitted when X-rays are irradiated onto a sample, allowing us to extract information about the electrons present within the sample. This technique provides information on the chemical composition, bonding states, and valence of the surface. Please feel free to contact us if you have any inquiries. 【Features】 ■ Composition analysis of the topmost surface at a few nm (Li～) is possible ■ Sensitivity is approximately 0.1 atomic% ■ Electronic state analysis (chemical bonding, valence, gap, etc.) is possible ■ Measurement of insulators and organic materials is possible (non-destructive analysis) ■ Measurement area ranges from several tens to several hundred μm in diameter *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

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XPS analysis of discolored copper material surface

XPS analysis of discolored copper material surface

In the investigation of the discoloration of metal components, qualitative analysis of the surface condition and evaluation using XPS of the thickness and depth distribution of the surface oxide film are very effective!

We would like to introduce the XPS analysis of the discolored copper material surface. The causes of copper discoloration can be due to the formation of corrosion products, as well as differences in the thickness of the surface oxide film (resulting in color changes due to light interference phenomena). Therefore, in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS), conducting depth profile analysis is also effective. In the attached PDF document, we present a case study where qualitative surface analysis and depth profile analysis of the copper material were conducted, comparing the discolored areas with the normal areas. Please take a look. [Evaluation of Copper Surface Discoloration] ■ Conducting depth profile analysis in addition to qualitative analysis of the very surface using X-ray photoelectron spectroscopy (XPS) is effective. *For more details, please download the PDF or feel free to contact us.

  • Other analysis and evaluation services

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