Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
Last Updated： Aggregation Period:Sep 17, 2025～Oct 14, 2025
This ranking is based on the number of page views on our site.
16～28 item / All 28 items
It is a vacuum deposition device for coating various metal thin films on the surfaces of granular or powdered samples.
By enabling evaporation from the source downwards, it has made it possible to deposit on non-fixable particulate samples.
Compact appearance and excellent internal mechanism.
A vacuum deposition device designed as the most versatile equipment for small-lot production, starting with experimental devices at universities and various research institutions.
This is an introduction to the vacuum deposition device.
○FZ Juelich Cluster -Installed at the HNF (Helmholtz Nanofabrication Facility) Juelich, Germany ○IQC Cluster Tool -Installed at the Institute for Quantum Computing at the University of Waterloo, Canada ○EIT+ Cluster Tool -Installed at the Wroclaw Research Centre EIT+, Wroclaw, Poland ○UTD Cluster Tool -Installed at the University of Texas at Dallas, USA ○FW Dresden Cluster ○Materials Innovation Platform ※For details on each device, please contact us.
Thin film manufacturing equipment capable of producing from experimental and small-scale production machines to large-capacity processing machines.
The thin film manufacturing equipment developed from the user's perspective incorporates extensive experience as a job coater, is designed from the user's standpoint, and is assembled through discussions with customers in an "order system." We offer a variety of types, ranging from small experimental and small-scale production machines to large-capacity processing machines. All of our equipment is custom-made. Since we have a diverse range of evaporation sources, we will proceed with the design of the equipment while asking what, how much, and in what manner you would like to process. For more details, please contact us or refer to our catalog.
Liftoff, thick film, low-temperature film deposition compatible - the top model that combines Showa Vacuum's technology.
The multifunctional vacuum deposition device "SEC-22C" employs an electron beam evaporation source as its evaporation source. It can deposit high melting point metals and oxides. The control of evaporation rate and film thickness is conducted using a quartz oscillation type thickness gauge. The main pump is equipped with a cryopump. The operation control system is fully automated. 【Features】 ○ The evaporation source and substrate fixture are arranged to achieve a good film thickness distribution. ○ The electron beam evaporation source uses a 6-point crucible, allowing for the deposition of six different materials in the same vacuum. ○ The substrate can hold 30 pieces of φ75mm, 20 pieces of φ100mm, and 9 pieces of φ150mm. ○ Deposition is possible within an incident angle of ±5°. ○ The anti-deposition shield inside the vacuum chamber is divided for easy replacement. For more details, please contact us or download the catalog.
All models are overhauled and delivered in a fully operational state.
At Green Tech Co., Ltd., we conduct complete overhauls and sell, maintain, and rent used vacuum equipment and devices that have been performance-verified. Our product lineup includes sputtering devices and vacuum deposition equipment, as well as measuring instruments like He leak detectors, and individual items such as power supplies, electron guns, vacuum gauges, and pumps. Please feel free to contact us if you have any requests. [Features] ■ Abundant stock of sales items ■ Complete overhauls conducted *For more details, please contact us.
A complete flow that you can trust to handle everything from model selection to consumable supply and after-sales support.
This catalog is a comprehensive catalog from Craft Co., Ltd., a specialized manufacturer of vacuum deposition equipment. (*Prostaff Co., Ltd. acts as a sales manufacturer for Craft Co., Ltd., while Prostaff plays a role in the manufacturing sector.) It includes a wide range of products, starting with the automatic vacuum deposition equipment [custom-made] CAP series, as well as maintenance menus and introductions to processed products. [Contents] ■ Automatic vacuum deposition equipment [custom-made] ■ Refurbished items [used items] ■ Equipment maintenance ■ Parts maintenance ■ Deposition materials and processed products, etc. *For more details, please download the PDF or feel free to contact us.
Flexible configuration available upon request for methods such as deposition, sputtering, and EB. Adopts a tall chamber with a height of 570mm, contributing to improved uniformity during deposition.
The ML-080, with a volume of 80 liters and dimensions of 400(W)x400(D)x570(H)mm, is composed of a D-type box chamber. It has the same configuration as the 060 model but features a taller chamber, which extends the TS distance adjustment range and improves film uniformity during deposition on large-diameter substrates, making it an optimal model for vacuum deposition. It is a higher-end model than the ML-060, which can also accommodate a load lock mechanism. Like the 060, it is compact yet supports a wide range of applications including resistance heating deposition (for metals, insulators, and organic materials), EB deposition, RF/DC/PulseDC compatible magnetron sputtering, RIE plasma etching, CVD, and annealing. - Maximum substrate size: Φ10 inches - Resistance heating deposition sources x up to 4 sources - Organic deposition sources x up to 4 sources - Magnetron sputtering cathodes x 4 sources - Electron beam deposition - Substrate heating stage (standard 500°C, max 1000°C) - *Plasma etching / <30W soft etching - CVD (thermal CVD, PECVD) *Plasma etching can be installed in both the main chamber and the load lock chamber.
Storage-compatible glove box PVD flexible thin film experimental device, featuring a tall chamber with a height of 570mm, contributes to improved uniformity during deposition.
MiniLab-080 glove box model with an 80ℓ large capacity chamber designed to be stored within a glove box bench. It features a slide-open and close chamber that maximizes the use of the workbench, and a rear-opening door designed with maintenance in mind. Samples processed can be consistently handled within a controlled environment inside the glove box without exposure to the atmosphere or moisture. For specifications of the GB gas purification unit, please refer to the GB model. ◉ Resistance heating evaporation source x up to 4 ◉ Organic evaporation source x up to 4 ◉ Magnetron sputtering cathode x 4 ◉ Electron beam evaporation ◉ Dry etching ◉ Annealing
Due to its modular embedded design, it is possible to flexibly assemble dedicated machines according to the required film formation methods. A compact thin-film experimental device that can accommodate various research applications.
**Flexible System** The MiniLab thin film experimental device series allows for easy construction of a compact system without waste, even as a customized product, by incorporating components (such as deposition sources and stages) and control modules tailored to the required deposition methods and materials from a wide range of options. By configuring the system with a modular control unit in a Plug&Play manner, the application range expands, enabling various thin film process experiments. The MiniLab series is a high cost-performance system that caters to a wide range of applications from research and development to small-scale production. **Small Footprint & Space-Saving** - Single Rack Type (MiniLab-026): 590(W) x 590(D)mm - Dual Rack Type (MiniLab-060): 1200(W) x 590(D)mm - Triple Rack Type (MiniLab-125): 1770(W) x 755(D)mm **Excellent Operability & Intuitive Operation Screen** Windows PC or 7” touch panel. Easy operation that does not require expertise, with maximum safety considerations.
We have incorporated all the latest vacuum deposition technology into a compact benchtop-sized device that can effectively utilize limited lab space.
High-performance organic source LTE (up to 4 sources) with excellent temperature responsiveness/stability for organic materials such as OLED, OPV, and OTFT, and a metal deposition source TE (up to 2 sources) that allows for easy exchange and maintenance. It can operate in manual mode, as well as in automatic modes for continuous multilayer film deposition and simultaneous film deposition. Despite its compact size, it achieves performance similar to that of standalone large machines without sacrificing basic performance, film quality, uniformity, or operability. Additionally, it features fully automated control via a simple touch panel with PLC. The user-friendly HMI allows anyone to operate it intuitively without requiring complicated operating procedures. It comes with remote software "IntelliLink," which connects to a Windows PC via USB cable, enabling monitoring of the device's operating status, log saving, online/offline recipe creation and saving, and fault analysis. This compact vacuum deposition system is designed to maximize the effective use of limited development and lab space while also excelling in maintenance.
Compact and space-saving! Ideal for research and development, flexible configuration for purposes such as deposition, sputtering, and annealing.
This is a flexible thin film experimental device for R&D that achieves minimal waste, compact size, simple operation, and high cost performance by integrating the necessary minimum modules and controllers into a 19" compact rack with a Plug&Play feel. It supports magnetron sputtering (up to 3 sources) or resistance heating evaporation (metal sources up to 4, organic materials x4), and can be equipped with a substrate heating stage, allowing for the production of annealing devices and plasma etching. There is also a glove box storage type available (specifications to be discussed). A wide range of optional components that can be flexibly customized is available. ◉ Maximum substrate size: Φ6 inch ◉ Resistance heating evaporation source filament, crucible, boat type (up to 4 sources) ◉ Organic evaporation source: 1cc or 5cc ◉ Φ2 inch magnetron cathode (up to 3 sources) ◉ Dry etching ◉ Glove box compatible (optional, specifications to be discussed) ◉ Other options: simultaneous deposition from 2 sources, HiPIMS, automatic thin film controller, custom substrate holders, substrate rotation/lifting, substrate heating, and many more options available. * Please first contact us with your required specifications, and we will configure the system according to your needs.
Optimal for the deposition of optical multilayer DBR films for LEDs!
Sapio-DBR (SGC-S1550i/S1300i series) is a vacuum deposition device specialized for optical multilayer DBR films for LEDs, offering good uniformity within the dome and enabling improved production efficiency. It is optimal for the deposition of optical multilayer DBR films for LEDs. 【Features】 ○ Excellent mass production performance → Substrate capacity: Approximately 400 pieces of φ2 inch wafers/batch Approximately 110 pieces of φ4 inch wafers/batch → Cycle time: Within 3 hours/batch → Required installation area: W4.6m × D6.3m × H3.2m * When using SGC-S1550i * Removal of the ceiling panel on the factory side may be necessary when attaching or detaching the quartz film thickness gauge. ○ Excellent reproducibility, continuous batch guarantee also available ○ Film quality adjustment is possible; we can assist with condition correction to suppress film damage due to chipping. For more details, please contact us or download the catalog.
