We have compiled a list of manufacturers, distributors, product information, reference prices, and rankings for Vacuum deposition equipment.
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Vacuum deposition equipment Product List and Ranking from 20 Manufacturers, Suppliers and Companies

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

Vacuum deposition equipment Manufacturer, Suppliers and Company Rankings

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. テルモセラ・ジャパン 本社 Tokyo//Industrial Electrical Equipment
  2. 神港精機 東京支店 Tokyo//Industrial Machinery
  3. サンユー電子 Tokyo//Testing, Analysis and Measurement
  4. マイクロフェーズ Ibaraki//others
  5. 5 昭和真空 Kanagawa//Industrial Machinery
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Vacuum deposition equipment Product ranking

Last Updated： Aggregation Period:Sep 24, 2025～Oct 21, 2025
This ranking is based on the number of page views on our site.

  1. TMP type vacuum deposition device サンユー電子
  2. High-precision vacuum deposition device マイクロフェーズ
  3. Vacuum Deposition Device "MiniLab-080" テルモセラ・ジャパン 本社
  4. 4 Research and development vacuum deposition device 神港精機 東京支店
  5. 4 Vacuum Deposition Device "MiniLab Series" テルモセラ・ジャパン 本社

Vacuum deposition equipment Product List

1～15 item / All 28 items

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Research and development vacuum deposition device

Research and development vacuum deposition device

Flexible response according to purpose and cost! For universities, public research institutions, and basic experiments.

The "Vacuum Deposition Device for Research and Development" is a series of compact deposition devices suitable for universities, public research institutions, and basic experiments. We offer two models: a front-door type equipped with an electronic evaporation source as standard and a simplified experimental type based on a fully manual resistance heating source. Both models (front-door type and simplified experimental type) can be flexibly customized according to purpose and cost. We have demo units available for sample testing. 【Features】 ■ Proven hardware with flexible cost options ■ A wide range of optional features tailored to specific needs (high-temperature heating, substrate cooling, multi-source simultaneous deposition, evaporation sources for organic materials, lift-off process support) ■ Support for ionization mechanisms such as plasma electrodes and RF coils, with options for additional plasma electrodes ■ Consistent customer support from sample testing to hardware customization and post-delivery follow-up *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment

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Vacuum deposition equipment for wafer processes

Vacuum deposition equipment for wafer processes

Achieves a film formation mechanism with excellent film thickness uniformity and high-speed exhaust! Capable of stably forming high-quality electrode films.

The "Vacuum Deposition Device for Wafer Processes" is a batch-type deposition device designed for forming electrode films on wafers up to 6 inches in size. It has a wealth of experience in mass production applications for discrete ICs, compound ICs, and MEMS devices. The device can stably form high-quality electrode films due to its film formation mechanism, which excels in film thickness uniformity, and an oil-free exhaust system that enables rapid evacuation. It boasts a high operational rate as a deposition device for mass production applications. 【Features】 ■ Highly reliable basic configuration ■ Abundant optional mechanisms - Evaporation sources, multi-beam electron guns (10kW), resistance heating evaporation sources, multi-source simultaneous deposition mechanisms - High-temperature heating (up to 550°C) = three-sided planetary dome - Substrate cleaning, ion guns, RF bombardment mechanisms - Substrate dome, three-sided planetary dome, revolution dome, high-temperature heating revolution dome *For more details, please refer to the PDF materials or feel free to contact us.

  • Evaporation Equipment

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Experimental small vacuum deposition device

Experimental small vacuum deposition device

Equipped with MAX10V-150A power and a large-capacity LN2 trap, it enables rapid sample preparation. Its compact size makes it space-saving and reasonably priced.

Container dimensions: φ150×200H, exhaust system: 2-inch diffusion pump (with LN2) + rotary pump 20L/min. A 2-inch size is used for the main valve to effectively utilize the pump's exhaust capacity. The metal parts of the vacuum container, main valve, three-way valve, and leak valve are made of stainless steel.

  • Company：ヤシマ
  • Price：1 million yen-5 million yen
  • Other surface treatment equipment

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Electron beam vacuum deposition device

Electron beam vacuum deposition device

Metal coating and shadowing become ultra-fine particle deposition, improving resolution!

This device is developed as a deposition system suitable for all metals, particularly magnesium alloys, with the aim of advanced sample preparation in a clean high vacuum using an electron beam. The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing fully automated exhaust systems with all electromagnetic valves. The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. Additionally, we offer a "Magnetron Sputtering System" for coating tungsten thin films for electron microscopes, as well as a "3KV Ion Gun (SIG030)" used for thin film preparation and surface analysis experimental research. 【Features】 - The vacuum exhaust system combines a TMP of 80L/sec and an RP of 50L/min, utilizing a fully automated exhaust system with all electromagnetic valves. - The achievable pressure reaches 10^-5 Pa without a liquid nitrogen trap. - Metal coating and shadowing are performed through ultra-fine particle deposition, resulting in improved resolution. *For more details, please refer to the related links or feel free to contact us.*

  • Vacuum Equipment

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Glove box integrated vacuum deposition device

Glove box integrated vacuum deposition device

You can attach and detach the bell jar inside the glove box, and exchange or replenish the substrate and deposition materials!

We would like to introduce our "Glove Box Integrated Vacuum Deposition System." This compact deposition bell jar can deposit on 50×50 substrates and is housed within a glove box. You can attach and detach the bell jar inside the glove box to exchange or replenish substrates and deposition materials. 【Features】 ■ Capable of depositing on 50×50 substrates ■ Compact deposition bell jar housed within the glove box ■ Ability to attach and detach the bell jar inside the glove box to exchange or replenish substrates and deposition materials *For more details, please refer to the PDF document or feel free to contact us.

  • Evaporation Equipment

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Vacuum products - Vacuum deposition device

Vacuum products - Vacuum deposition device

The management innovation plan has been approved for the small roll coater.

For vacuum deposition equipment, please leave it to Fuji R&D Corporation. For more details, please contact us.

  • Other processing machines

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Compact! Simultaneous deposition! High expandability! 'Vacuum Deposition Equipment - HEX Series'

Compact! Simultaneous deposition! High expandability! 'Vacuum Deposition Equipment - HEX Series'

A versatile vacuum deposition device that allows for flexible configuration changes like assembling blocks | Sputtering, resistance heating deposition, electron beam deposition, organic deposition.

The HEX system features a unique "modular structure." By exchanging the panels that make up each face of the hexagonal prism-shaped chamber, you can freely change the number and arrangement of ports. As a result, you can easily modify the configuration and expand functionality, much like assembling blocks, in response to changes in research direction. The HEX system is a compact and highly expandable vacuum deposition device that fills the gap between benchtop systems and UHV systems, based on a new concept. ◆ The "modular structure" allows for flexible changes to the system configuration ◆ Supports sputtering, resistance heating deposition, electron beam deposition, and organic deposition ◆ Supports simultaneous film formation from multiple sources ◆ Compatible with sample rotation, heating, and water cooling ◆ Can be equipped with a film thickness monitor ◆ Compact design with a footprint of 60cm x 60cm ◆ Excellent expandability and maintainability ◆ Compatible with glove boxes (for lithium-ion batteries, etc.) For more details, please refer to the catalog available for download as a PDF. If you have any questions, please feel free to contact us.

  • Sputtering Equipment

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Vacuum Deposition Device "LA-V5050"

Vacuum Deposition Device "LA-V5050"

Vacuum deposition equipment that can be used as a pre-treatment device for TEM, SEM, and EPMA, as well as for the production of thin films and electrode films.

Labotech Inc.'s "LA-V5050" is a standard resistance heating vacuum deposition device. It is a desktop-type low-cost turbo vacuum deposition device designed with a focus on operability. It can quickly achieve a high vacuum state, making it suitable for pre-processing for TEM, SEM, and EPMA. Additionally, by selecting a cartridge holder, it can be used as a thin film device/electrode film production device. 【Features】 ■ Desktop type ■ Focus on operability ■ Speedy *For more details, please contact us or download the catalog.

  • Other physicochemical equipment

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[Equipment Introduction] Large Vacuum Deposition System

[Equipment Introduction] Large Vacuum Deposition System

We provide highly reliable products! We are equipped with advanced measuring and processing machines tailored to our expertise.

We would like to introduce the "Large Vacuum Deposition Equipment" owned by Okamoto Optics Co., Ltd. We possess two types of deposition: EB deposition and IAD deposition. Additionally, we are equipped with numerous facilities, including polishing machines, interferometers, and three-dimensional measuring devices. Our company is characterized by its ability to perform high-precision processing of large lenses and flat surfaces, and we can accommodate not only glass but also ceramics. Please feel free to contact us if you have any requests. 【Features】 - In-house equipped with advanced measuring and processing machines tailored to our know-how - Capable of providing highly reliable products - High-precision processing of large lenses and flat surfaces - Accommodates both glass and ceramics *For more details, please download the PDF or feel free to contact us.

  • Evaporation Equipment

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Small Vacuum Vapor Deposition Device "HVE-100" [Achieving Clean Film Formation!]

Small Vacuum Vapor Deposition Device "HVE-100" [Achieving Clean Film Formation!]

A compact vacuum deposition device capable of clean film formation! It is equipped with a shutter, allowing for stable deposition!

The "HVE-100" is a compact vacuum deposition device that saves space. The substrate deposition surface is installed facing downward, and the arrangement allows for deposition upwards through evaporation from a resistance heating source (deposition up). It is equipped with a shutter, enabling stable deposition. 【Features】 ■ High vacuum exhaust system: Achieves a vacuum level of <10^-4Pa for clean film formation ■ The chamber is made of SUS for easy maintenance and has internal anti-deposition plates ■ Space-saving/compact: Desktop model with dimensions of W500×D395mm ■ Compatible with your existing exhaust system and film thickness measurement devices *For more details, please refer to the PDF document or feel free to contact us.

  • Vacuum Equipment
  • Evaporation Equipment

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BAK Family Fully Automatic Vapor Deposition Function Equipped

BAK Family Fully Automatic Vapor Deposition Function Equipped

Introducing the BAK deposition platform that allows for various chamber sizes and process automation options.

The "BAK Family," a deposition machine equipped with a new level of flexibility and process control, not only provides deposition work for power devices, wireless, LEDs, MEMS, and photonics but also represents a new generation of deposition equipment that achieves automatic substrate exchange and high throughput. From the compact BAK501 for universities and research institutions to the Multi BAK for mass production, we can propose a suitable BAK for all customers, from research and development to mass production. 【Features】 ■Selectable deposition distances from 0.5m to 2.0m ■Highly flexible processes that allow the use of multiple materials without vacuum break ■Fully automated options incorporating load locks and loading robots *For more details, please refer to the related links or feel free to contact us.

  • Evaporation Equipment

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Organic EL Vacuum Deposition Device

Organic EL Vacuum Deposition Device

Organic EL Vacuum Deposition Device

The mask alignment mechanism achieves nano-order alignment using a fine motion piezo XY table and a coarse motion stepping motor XYΘ table.

  • Hydraulic Equipment

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Liftoff process compatible vacuum deposition equipment

Liftoff process compatible vacuum deposition equipment

This is a dedicated deposition device designed for the lift process commonly used in high-frequency communication devices.

The "Lift-off Process Compatible Vacuum Deposition System" is a dedicated deposition device designed for the lift-off process, widely used in optical devices and high-frequency communication devices such as compound semiconductors and SAW devices. Equipped with an electron gun and resistance heating electrodes as evaporation sources, it enables the formation of thick films, including high-melting-point electrode films and precious metals. It excels in the verticality of the incident angle of evaporated particles onto the substrate, and low-temperature deposition is possible due to various mechanisms that prevent temperature rise of the substrate during film formation (substrate water cooling mechanism, reflective electron trap for the electron gun, radiation light prevention measures). **Features** - Verticality of the incident angle of deposition particles onto the substrate (90°±3° at 6-inch wafers) - Low-temperature deposition (below 70°C = proven value) due to the substrate water cooling mechanism - High-speed exhaust with a large-diameter exhaust system and clean background for dense film quality - Flexible hard and soft compatibility with a rich variety of options (single wafer type = CtoC conversion, load lock conversion, composite process = load lock conversion + bonding with other process chambers) - A demo unit is permanently available for sample testing. *For more details, please refer to the PDF document or feel free to contact us.*

  • Evaporation Equipment

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TMP type vacuum deposition device

TMP type vacuum deposition device

Adoption of an easy-to-operate TMP exhaust system! A tabletop vacuum deposition device with excellent expandability.

The "SVC-700TMSG/7PS80" is a resistance heating vacuum deposition system of the TMP + RP type. It is a device focused on compactness and ease of use. It consists of the exhaust system "SVC-700TMSG" and the deposition power supply "SVC-7PS80." With its simple and easy operation, it also considers future functional expansions. A wide range of options expands the possibilities for thin film fabrication experiments. Additionally, dedicated options are available for experiments involving the fabrication of organic thin films. We also accept inquiries regarding installation within glove boxes (with many successful cases). 【Features】 ○ Compact size ○ Excellent expandability as a tabletop vacuum deposition system ○ Easy-to-operate TMP exhaust system adopted ○ Abundant options ○ Installation within glove boxes is also possible

  • Evaporation Equipment

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High-precision vacuum deposition device

High-precision vacuum deposition device

Productivity increased fourfold with a sample holder capable of 360-degree rotation and tilting.

It is a vacuum deposition device that forms various metal thin films on a substrate-like sample surface, with the film thickness being accurately controlled. It has very convenient features for investigating thickness dependence and evaporation rate dependence.

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