真空デバイス List of Products and Services

The advanced sample preparation begins with clean high vacuum. It is a clean high vacuum deposition system that employs a turbo molecular pump (TMP) exhaust system. High vacuum contributes to improved film purity and film density. By pressing the EVAC START button on the panel, the system automatically transitions from rough pumping to high vacuum pumping. It features a touch panel and program control for a safety design that prevents operational errors. The VE-2050 comes with a variety of optional accessories. We also accept modifications to add functions tailored to research purposes.

• Other physicochemical equipment

★ VE-2013 is a simplified vacuum deposition device that inherits the concept of VE-2030 (our product). ★ A compact body with an integrated TMP has been realized. It is a desktop type, so it does not take up installation space (RP is floor-mounted). ★ By using a small TMP and RP exhaust system, we provide a high vacuum deposition device at a low price. ★ Exhaust operations are fully automated and controlled by simply turning the touch panel switch ON/OFF. ★ The use of a tungsten basket allows for deposition of materials such as gold, aluminum, chromium, and silver. ★ For carbon deposition, a clamp deposition gun type is used to deposit dedicated carbon with a diameter of 0.5mm. (φ5mm carbon rods cannot be used.)

• Other physicochemical equipment

The VC-300 series enables reliable carbon deposition by using rotary pump exhaust and monitoring vacuum levels with a Pirani gauge. The carbon is in a replaceable core type with a diameter of 0.5 mm, eliminating the need for trimming and keeping the surroundings always clean. Additionally, the electrode part does not become hot, so there is no risk of burns during continuous deposition. It achieves space-saving and low cost.

• Analytical Equipment and Devices
• Spectroscopic Analysis Equipment
• Other physicochemical equipment

The Magnetron Sputtering Device MSP-40T is a multipurpose, multi-metal, experimental ion sputtering deposition system. It features an electrode-separated sample stage to avoid sample damage, efficient deposition with high-speed exhaust and simple operation, and offers good cost performance at a low price. As a successor to the MSP-30T, it has been upgraded with full auto-coating, a touch panel, and recipe functions. For more details, please contact us or refer to the catalog.

• Other FA equipment

This device is designed to store TEM holders under oil-free vacuum conditions. By using this device, it is possible to significantly reduce the adhesion of contamination. It is stored in an independent vacuum chamber, allowing for individual access. The TEM holder port will be manufactured to match the TEM holder used by the customer.

• Vacuum Equipment

A new type of osmium coater for pre-treatment for electron microscope observation. We have fully automated parts that were previously difficult to operate manually. This represents a new dimension of osmium coating that allows for safer and easier operations. Equipped with a touch panel, it enables simple and clear operation. Anyone can easily create conductive films for electron microscopes. Additionally, we offer a variety of options to enhance safety and functionality. This device has been meticulously designed, yet we have achieved an astonishingly low price. If you are interested in osmium coating or have concerns about operation, please consider our osmium coater. We are also accepting requests for test coating and demonstrations at any time.

• Other physicochemical equipment
• Plasma surface treatment equipment
• Plasma Generator

The multifunctional sample rapid freezing device VFZ-101 can perform both pressure freezing with a metal block and immersion freezing with liquefied propane. The frozen samples can be stored in surrounding cups without exposure to the atmosphere. By placing a fixative in the surrounding cups, it can be used as a freeze substitution fixation device. It is portable, allowing for sample collection at any location. For more details, please contact us or refer to the catalog.

• Other physicochemical equipment
• Stainless steel utensils and containers
• Stainless steel container

The multi-film deposition device VES-10 is a compact tabletop unit that fully integrates hydrophilic treatment, deposition, and ion sputtering functions. It deposits replacement leads for mechanical pencils. It uses a magnetron target for low-damage sputtering. The operations for ion sputtering and hydrophilic treatment are fully automated, allowing for automatic execution from the start of evacuation to the end of coating. Function switching is easy with just one button. For more details, please contact us or refer to the catalog.

• Other physicochemical equipment
• Plasma surface treatment equipment
• Other surface treatment equipment

The Plasma Ion Bomber PIB-20 model is a multifunctional version of our popular PIB-10 hydrophilic treatment device. It is a high-performance device capable of hydrophilic treatment of support membranes for TEM, cleaning of diamond knives, etching of organic materials, and bonding of PDMS, among various other applications. Equipped with a full-auto function, it can be operated with just the push of a button after adjustments! For those who find it difficult to introduce RF plasma devices or have been unable to afford expensive RF plasma devices, we offer a high-performance AC plasma device at a low price! For more details, please contact us or refer to the catalog.

• Other physicochemical equipment
• Plasma surface treatment equipment

The Plasma Ion Bomber PIB-10 is a gentle AC ion bombardment device for samples. It is easy to operate; just press a button, and there is no skill required. It is compact and does not take up much space, making it effective in a corner of your desk. You can switch between software and hardware. For more details, please contact us or refer to the catalog.

• Plasma surface treatment equipment

The t-butanol freeze-drying device VFD21-S is a pre-treatment device for scanning electron microscopes. The sample stage is electronically temperature controlled. The freezing and heating of the sample can be performed under vacuum. Cooling to 5°C takes 10 minutes, and heating to 40°C takes 10 minutes. For more details, please contact us or refer to the catalog.

• Other physicochemical equipment

The Magnetron Sputtering Device MSP-8 Inch features a magnetron target electrode and is equipped with a large-area sample stage compatible with 8-inch wafers. The variation in coating thickness is within 10%, effectively utilizing the entire stage area. Coating is done at a voltage of 500V or lower to reduce damage from ion impact. For more details, please contact us or refer to the catalog.

• Other FA equipment

The Magnetron Sputtering Device MSP-20-TK is a tungsten coating device for applying conductive treatment to electron microscope samples. By adopting a magnetron target, it minimizes sample damage. For more details, please contact us or refer to the catalog.

• Plasma surface treatment equipment
• Other surface treatment equipment
• Other physicochemical equipment

The Magnetron Sputtering Device MSP-20MT is a coating device for applying conductive treatment to electron microscope samples. It uses a magnetron target to minimize sample damage. It is designed for a 4-inch target size and can process large samples or multiple samples at once. For more details, please contact us or refer to the catalog.

• Other FA equipment

The Magnetron Sputtering Device MSP-1S allows for coating at low voltage and features a floating sample stage, ensuring no damage to the samples. It is a magnetron-type ion coater that is gentle on samples. Its compact size means it doesn't take up much space and can operate in a corner of your desk. For more details, please contact us or refer to the catalog.

• Other FA equipment

The Magnetron Sputtering Device MSP-20UM is a device used for applying conductive film treatment to samples for electron microscopy. It employs a magnetron target to minimize sample damage. It is equipped with adjustment functions that allow it to accommodate various applications. It also has features for introducing and adjusting the pressure of argon gas and other gases, which contributes to improving film purity. For more details, please contact us or refer to the catalog.

• Other FA equipment

The coating is done at a very low voltage using a magnetron electrode. A simple yet highly glossy metal film can be coated with just one touch. Set the sample. Set the timer according to the desired coating thickness. Once you press the start button, it automatically progresses from preliminary evacuation to coating. When the coating is complete, the RP stops and automatically air leaks.

• Other machine tools