Educational and Research Institutions

Tohoku Techno Arch Co., Ltd.

addressMiyagi/Aoba-ku, Sendai-shi/Aobayama 6-6-10, 2nd floor, Tohoku University Center for Advanced Future Science and Technology Research
phone022-222-3049
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316～360 item / All 410 items

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Tohoku Univ. Technology : Batch fabrication method by laminating method : T24-029

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Hokkaido Univ. Technology : Bio-Catalytic Approach to Mesoscopic Particle Synthesis : HK24-007

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Tohoku Univ. Technology : Method for producing spherical zinc oxide : T19-905

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Tohoku Univ. Technology : Multilayer structure and its manufacturing method : T24-027

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Tohoku Univ. Technology : Device to measure nanoparticle distribution : T24-030

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Tohoku Univ. Technology : Room temperature wafer bonding : T24-033

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Hokkaido Univ. Technology : High-sensitivity single-sided pressure sensor with depth detection：HK24-002

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Tohoku Univ. Technology : Estimation method of grain size of crushed stone : T24-032

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Hokkaido Univ. Technology : Electrode and control method of Overvoltage : HK24-016

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Hokkaido Univ. Technology : The most Advanced Analog RoF technology of Beyond 5G (6G) : HK24-009

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Tohoku Univ. Technology :Aluminum recycling technology : T21-372

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Tohoku Univ. Technology:Diaper sensors:T24-065

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Tohoku Univ. Technology : The Process of Copper Electrorefining : T23-082

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Tohoku Univ.Technology : Piezoelectric thin film & Piezoelectric device : T17-157

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Tohoku Univ. Technology : Method for producing microorganism carrier : T24-062

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Tohoku Univ. Technology : Tin Iodide Perovskite Thin Film : T24-077

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Hokkaido Univ. Technology : Optical antenna : HK24-018

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Tohoku Univ. Technology : Soil estimation method : T24-070

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Tohoku Univ. Technology :Aspergillus oryzae introduced with multi-copy genes : T24-084

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Tohoku Univ. Technology : Quantum bit / Quantum sensor material using SiO2 : T24-052

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Tohoku Univ. Technology : A novel mitochondrial oxidative stress marker : T24-075

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Tohoku Univ. Technology : Assessment tool for circadian rhythm sleep-wake disorder : T23-062

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Tohoku Univ. Technology : 13C Immobilized Reagent : T23-086

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Tohoku Univ. Technology : Small molecule inhibitors of Vasohibin-2 : T23-047

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Tohoku Univ. Technology : Distributed curvature crystal lens and X-ray reflectance measurement device : T07-098

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Tohoku Univ. Technology : A Nonvolatile Register with a Differential Information Storing Scheme : T24-080

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Tohoku Univ. Technology : A Nonvolatile Register with a Reference Load Sharing Scheme : T24-081

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Tohoku Univ. Technology : Hue specific superposition marker : T24-097

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Tohoku Univ. Technology : Biophotoacoustic spectroscopy system : T21-342

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Tohoku Univ. Technology: Highly Dispersible Filamentous Fungi with Reduced Hypoxia and Viscosity in Culture: T24-082

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Tohoku Univ. Technology: Highly Dispersible Filamentous Fungi with Reduced Adhesion and Aggregation to Culture Tank Equipment : T23-061

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Tohoku University Technology: Electrostatic MEMS Speaker: T17-099

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Tohoku Univ. Technology : Carbon dioxide fixation method : T20-1059_T23-099

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Tohoku Univ. Technology：Amorphous nanoparticles, production method and dispersion: T16-087

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Tohoku University Technology: Positive electrode material for magnesium storage battery: T18-490

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Tohoku University Technology: Positive electrode material for magnesium storage battery: T19-070

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Tohoku Univ. Technology:High-density culture of mutant filamentous fungi: T12-060

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Tohoku Univ. Technology : Treatment programs for people with bipolar disorder : T24-089

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Tohoku Univ. Technology : Method for producing metal catalyst capable of uniformly highly dispersing metal particles : T13-036

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Tohoku University Technology: Non-fluorinated PTFE water dispersant : T19-448

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Tohoku Univ. Technology：Synthesis method for position-controllable transition metal dichalcogenides: T15-167

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Tohoku Univ. Technology : Multilayer ceramics and methods of production : T21-249

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Tohoku Univ. Technology : Quantitative analysis of amyloid nucleation from droplets : T21-234

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Tohoku Univ. Technology : High brightness fluorescent calcium sensor : T20-1178_T20-1180_T20-1182_T20-1183_T21-303

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Tohoku Univ. Technology : Flow control method : T23-028

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