サミットスーパーアブレーシブ Product Lineup

Features ◆ Compared to general single crystal diamond particles, the polishing power lasts longer and has a longer lifespan. ◆ It is less prone to scratches, resulting in a finer finish.

• Other abrasives
• Other consumables

Features ◆ Carefully selected diamond abrasives for high finishing performance. ◆ Good dispersion, providing stable polishing power. ◆ Customizable to match the workpiece and application.

• Other abrasives
• Other consumables

Features ◆ Excellent polishing rate. ◆ Non-agglomerating, high dispersibility. ◆ Uniform and good finish surface can be obtained.

• Other abrasives
• Other consumables

Features ◆ Uniform particle size (sharp particle size distribution, spherical particles). ◆ High efficiency (unique formulation, stable pH). ◆ High flatness (surface quality: Ra < 0.2 nm, TTV < 3 μm). ◆ High number of circulation uses. ◆ Capable of low-temperature polishing (below 35°C). ◆ We offer a specially formulated slurry for processing SIC wafers. ◆ Neutral and weakly acidic slurries are available for aluminum nitride processing.

• Other abrasives
• Other consumables

◆Excellent grinding efficiency with a dedicated lubricant formulation. ◆Increases the number of circulation uses. ◆Reduces chip rate and achieves better TTV. ◆Excellent cooling and lubrication effects. ◆Good dispersion of abrasive particles, resistant to settling.

• Other consumables
• Other abrasives

Features ◆ Equipped with a chip pocket that prevents clogging. ◆ The uneven polishing layer has self-sharpening properties and a long lifespan. ◆ Good surface flatness, making it difficult to scratch the panel surface. ◆ Excellent polishing power and cleaning effect.

• Other abrasives
• Other consumables

Features ◆ Ideal for removing foreign substances and dirt due to excellent cleaning effectiveness. ◆ Specially designed structure prevents the loss of abrasive materials. ◆ Based on carefully selected fabric, it prevents scratches.

• Other consumables
• Other abrasives

Features ◆ Achieves a mirror-like effect after polishing. ◆ Made of a flocked substrate, making it easy to remove foreign substances from chip pockets and difficult to scratch. ◆ High cushioning properties, resulting in less damage to panels. ◆ Offers high cost performance.

• Other abrasives
• Other consumables

Features ◆ Minimal variation and stable quality. ◆ Excellent strength and flexibility, maximizing polishing characteristics. ◆ High polishing efficiency, outstanding durability, contributing to reduced production costs. ◆ Applicable for both dry polishing and polishing using water and oil.

• Other abrasives
• Other consumables

Features ◆ Achieves a uniform and stable finish with electrostatically coated abrasives. ◆ The grooves on the surface capture grinding debris and prevent scratches. ◆ Adaptable to wet grinding due to a polyester base that is resistant to water and oil. ◆ Excellent wear resistance and long lifespan.

• Other abrasives
• Other consumables

◆Minimal variation and stable quality. ◆Excellent strength and flexibility, maximizing polishing characteristics. ◆High polishing efficiency, outstanding durability, contributing to reduced production costs. ◆Applicable for both dry polishing and polishing using water and oil.

• Other abrasives
• Other consumables

Features ◆Single Crystal Diamond Slurry Single crystal diamond slurry has high grinding power and enables low-cost processing, making it widely used for grinding and polishing hard materials. ◆RCD Diamond Slurry RCD diamond slurry is harmonized with our proprietary RCD diamond powder and advanced dispersion technology, providing a diamond slurry that is resistant to scratching and has high dispersion stability. It is primarily ideal for polishing processes of sapphire, ceramics, and hard alloys.

• Other abrasives
• Other consumables

Features ◆ Uses in-house synthesis, purification, classification, and harmonization technology (GRISH products). ◆ High dispersion, resistant to scratching. ◆ High polishing rate and excellent surface finish. ◆ Ensures quality stability between lots. ◆ Capable of offering a wide range of product lineup.

• Other abrasives
• Other consumables

Features ◆ There are many contact points between the particles and the workpiece during the processing, which enhances polishing efficiency. ◆ It has self-sharpening properties and high polishing durability. ◆ It has a fine cutting edge shape that reduces surface roughness. ◆ The particles have high sphericity, which minimizes scratches.

• Other abrasives
• Other consumables

Features ◆ Sharp particle size distribution and excellent quality stability. ◆ A wide range of particle sizes, offering optimal sizes and grades according to application. ◆ Ideal for polishing and finishing precision parts such as carbide, ceramics, molds, and difficult-to-machine materials.

• Other abrasives
• Other consumables

Features ◆ High dispersion and stable quality. ◆ Fine particle size with a high specific surface area (300-420 m²/g). ◆ High impurity content (below 100 PPM). ◆ Excellent wear resistance, corrosion resistance, and thermal conductivity.

• Other abrasives
• Other consumables

Features ◆Higher polishing speed can be achieved compared to single crystal diamond particles, and scratches are less likely to occur. ◆High strength and self-sharpening properties make it ideal for lapping and polishing sapphire, precision ceramics, and more. ◆Excellent wear resistance and long lifespan.

• Other abrasives
• Other consumables