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Exposure device
The mask aligners from Süss MicroTec, equipped with a sophisticated exposure optical system, are ideal for thick and thin film coating layer applications and boast the highest alignment accuracy. They offer a wide range of products, from research and development equipment to fully automated mass production systems. Süss MicroTec's mask aligners are particularly used in lithography applications in the fields of MEMS, advanced packaging, 3D packaging, compound semiconductors, power devices, solar energy, nanotechnology, and wafer-level optics.