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兼松PWS

EstablishmentSeptember 1982
capital3000Ten thousand
number of employees80
addressKanagawa/Kohoku-ku, Yokohama-shi/Shinba-cho 925
phone045-544-1811
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last updated:Mar 12, 2025
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兼松PWS List of Products and Services

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Exposure device Exposure device
Dual-Sided Position Accuracy Measuring Device DSM8Gen2 Dual-Sided Position Accuracy Measuring Device DSM8Gen2
Inkjet device Inkjet device
Automatic analysis device for semiconductor plating solution Automatic analysis device for semiconductor plating solution
Multi-Laser Dicing Equipment ICA1205 Multi-Laser Dicing Equipment ICA1205
Die Bonder & Flip Chip Bonder Die Bonder & Flip Chip Bonder
Wire bonding device Wire bonding device
Package Post-Inspection Device Skyhawk Package Post-Inspection Device Skyhawk
Exposure

Exposure device

The mask aligners from Süss MicroTec, equipped with a sophisticated exposure optical system, are ideal for thick and thin film coating layer applications and boast the highest alignment accuracy. They offer a wide range of products, from research and development equipment to fully automated mass production systems. Süss MicroTec's mask aligners are particularly used in lithography applications in the fields of MEMS, advanced packaging, 3D packaging, compound semiconductors, power devices, solar energy, nanotechnology, and wafer-level optics.

SUSS MicroTec Manual Mask Aligner MJB4

Manual exposure machine compatible with up to 4-inch square substrates.

The ZS Microtech MJB4 is a manual mask aligner (exposure device) that can accommodate substrates up to 4 inches square. It features simple operability, high-precision alignment, and high exposure resolution. It can be used not only for research and development purposes but also for small-scale production.

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SUSS MicroTec Manual Mask Aligner MA/BAGen4

Compatible with substrates up to 8 inches and supports semi-auto alignment exposure equipment.

The Zeiss Microtech MA/BA GEN4 is a semi-auto alignment exposure machine capable of handling substrates up to 8 inches square. It is equipped with optimal features for R&D and small-scale production applications in MEMS, optical components manufacturing, and compound semiconductors. The optimized alignment mark observation optical system and image processing capabilities enable precise alignment with minimal variation.

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