SCREENファインテックソリューションズ List of Products and Services

The "Research Coater" is a slit coater (die coater) that expands the advanced coating technology of "Coater Developers," which boasts numerous adoption achievements in the manufacturing processes of LCD and organic EL displays, to a lab scale. It is equipped with a slit-type coating device, the "Linear Coater(TM)," which can accurately slit coat low to high viscosity coating materials ranging from 1 to 10,000 mPa·s on various substrates such as glass substrates, resin substrates, films, and metal foils. This product is suitable for research and development and small-scale production environments where precise coating is required, and it is particularly recommended for customers considering material development and improvement. 【Features】 ■ Compact and easy to introduce ■ Selection of coating patterns according to application, such as full surface, stripes, and blocks ■ Coating possible from a minimum of 50cc (piping volume 15cc) of material (LC-R300G) ■ By installing an optional environmental chamber, coating experiments can be conducted under controlled conditions for oxygen, moisture, etc. (LC-R300G) ■ Vacuum drying devices and hot plate firing devices can also be proposed *For more details, please refer to the materials. Feel free to contact us with any inquiries.

• Other painting machines
• Coater
• Other surface treatment equipment

The "Coater Developer," which is essential in the manufacturing process of LCD and organic EL displays, is a device that uniformly applies and develops a chemical solution at high speed on a massive glass substrate of up to about 3 square meters at a level of 1 micrometer. Our company has achieved the world's top market share (Note: for array coater developers, based on our 2022 research). The "Research Coater" is a slit coater (die coater) that expands this coating technology to a lab scale. Despite its small size, it achieves very high precision uniformity and can be utilized in various scenarios such as experiments, prototypes, and small-scale production. 【Key Points for Choosing Our Product】 ■ Compact and easy to introduce ■ Numerous achievements in corporate and university research labs ■ Experiments and evaluations can be conducted with a process similar to mass production equipment, keeping production machine considerations in mind ■ Coating patterns tailored to applications, including full coating, stripe coating, and block coating ■ Vacuum drying devices and hot plate firing devices are also available (optional) ★ Please first check the product catalog by downloading the PDF below.

• Coater

The "Coater Developer," which is essential in the manufacturing process of LCD and organic EL displays, is a device that uniformly applies and develops a chemical solution at high speed on a massive glass substrate measuring up to about 3 meters square, and our company has achieved the world's top market share (Note: for array coater developers, as of 2022, according to our research). The "Research Coater" is a slit coater (die coater) that expands this coating technology to a lab scale. Despite its compact size, it achieves very high precision uniformity and can be utilized in various scenarios such as experiments, prototypes, and small-scale production. 【Reasons to Choose Our Product】 - Compact and easy to introduce - Numerous achievements in corporate and university research labs - Evaluation possible with production machine considerations in mind, using the same process as mass production equipment - Coating patterns tailored to applications, including full coating, stripe coating, and block coating - Can coat from a minimum of 50cc (with a piping volume of 15cc) of material (LC-R300G) - Coating experiments possible under controlled environments for oxygen, moisture, etc. (LC-R300G, optional) - Vacuum drying equipment and hot plate sintering equipment also available (optional) Please take a look at the product catalog first by downloading it from the "PDF Download" section below.

• Coater

The "Coater Developer," which is essential in the manufacturing process of LCD and organic EL displays, is a device that uniformly applies and develops chemical solutions at high speed on large glass substrates measuring up to approximately 3 meters square, and our company has achieved the world's top market share (Note: for array coater developers, as of 2022, according to our research). The "Research Coater" is a slit coater (die coater) that expands this coating technology to a lab scale. Despite its compact size, it achieves extremely high precision uniformity and can be utilized in various scenarios such as experiments, prototypes, and small-scale production. 【Key Points for Choosing Our Product】 ■ Compact and easy to introduce ■ Numerous achievements in corporate and university research labs ■ Evaluation possible with production machine considerations in mind, using the same processes as mass production equipment ■ Coating patterns tailored to applications, including full coating, stripe coating, and block coating ■ Experiments can be conducted with a minimum of 50cc of coating material (piping volume 15cc) using a micro-syringe pump ■ If installed in an environmental chamber (optional), control of oxygen, moisture, and other environmental factors is possible ■ Vacuum drying equipment and hot plate firing equipment are also available (optional) ★ Please check the product catalog first from the "PDF Download" below.

• Coater

The "Multi Coater LC-M Series" is a multi-functional slitting coating device that accommodates various coating materials from nano-level thin films to thick films and can also be configured for automatic systems. As an automatic machine, it supports inline integration with upstream and downstream process equipment and interfaces with LD/ULD. It allows for a flexible device configuration that can accommodate various processes, making it suitable for experiments and small-scale production. 【Features】 - Flexible device configuration that can accommodate various processes - Achieves high precision coating uniformity - No need for setup changes - Capable of preparing a wide variety of piping systems to achieve the desired film thickness and uniformity - In addition to full-area coating, stripe coating, intermittent coating, and block coating are also possible *For more details, please refer to the related links or feel free to contact us.

• Other processing machines

The "RT-R Series" is a coating and drying device that achieves roll-to-roll coating from thick films of high-viscosity materials to thin films of low-viscosity materials. It merges excellent coating technology with high-precision web transport technology. It caters to a wide range of needs, from research and development to mass production prototypes for various applications, including all-solid-state batteries and various secondary batteries. 【Features】 ■ Application of high-precision coating technology cultivated in display manufacturing equipment ■ Precise coating from low-viscosity to high-viscosity materials ■ Drying can be achieved with hot air ovens, and a push-pull method can also be incorporated ■ Options for coating patterns such as continuous coating, stripe coating, and intermittent coating are available *For more details, please refer to the related links or feel free to contact us.

• Other processing machines

The "VC-R400G" is a plasma CVD device that employs a unique LIA (Low Inductance Antenna) plasma source, achieving ultra-fast and high-quality vacuum deposition on flat substrates such as glass and metal. It is suitable for experiments, research, evaluation, and prototyping. By using the LIA-type inductively coupled plasma (LIA-ICP), it realizes fast, high-precision, and low-damage vacuum deposition. With multi-point control, it ensures finer uniformity. It offers a variety of manual and automatic options. 【Features】 ■ Suitable for experiments, research, evaluation, and prototyping ■ Achieves fast, high-precision, and low-damage vacuum deposition ■ Ensures finer uniformity through multi-point control of LIA ■ Realizes ultra-fast deposition more than five times compared to conventional methods ■ A wide range of options available *For more details, please refer to the related links or feel free to contact us.

• CVD Equipment

The "VC-R400F" is a plasma CVD device that employs a unique LIA (Low Inductance Antenna) method plasma source, enabling ultra-fast and high-quality vacuum film deposition on resin films and metal foils. It is well-suited for experiments, research, evaluation, and prototyping. By using the LIA method of inductively coupled plasma (LIA-ICP), it achieves fast, high-precision, and low-damage vacuum film deposition. With multi-point control, it ensures finer uniformity. It offers a variety of manual, automatic, and optional features. 【Features】 ■ Well-suited for experiments, research, evaluation, and prototyping ■ Achieves fast, high-precision, and low-damage vacuum film deposition ■ Ensures finer uniformity through multi-point control of LIA ■ Realizes ultra-fast film deposition more than five times compared to conventional methods ■ A wide range of options available *For more details, please refer to the related links or feel free to contact us.

• CVD Equipment

The "VS-R400G" is a sputtering device that adopts a unique LIA (Low Inductance Antenna) plasma source, achieving ultra-fast and high-quality vacuum deposition. Thanks to the assist effect of the LIA method's inductively coupled plasma (LIA-ICP), it reduces damage without lowering the deposition speed, resulting in high-quality film formation. Additionally, it can also accommodate reactive sputtering by leveraging the characteristics of high-density plasma. 【Features】 ■ A sputtering device suitable for experiments, research, evaluation, and prototyping ■ Reduces damage without lowering deposition speed, achieving high-quality film formation ■ Capable of reactive sputtering by utilizing the characteristics of high-density plasma ■ Enables faster deposition speeds by incorporating a rotary cathode ■ Easy to expand into production machines *For more details, please refer to the related links or feel free to contact us.

• Sputtering Equipment

The "VA-R400G" is a vacuum drying device that promotes drying by placing the substrate in a reduced pressure state after applying the chemical solution. The substrate support pins can be installed at any position, and by gradually changing the vacuum pressure, it is possible to suppress unevenness and foaming. Additionally, the device features a space-saving design that consolidates the vacuum pump, electrical box, and operation panel within the unit. 【Features】 ■ Space-saving design that consolidates the vacuum pump, electrical box, and operation panel within the unit ■ Capable of reduced pressure processing below 10 Pa ■ Substrate support pins can be installed at any position ■ By gradually changing the vacuum pressure, it is possible to suppress unevenness and foaming ■ Capable of incorporating pressure waveform monitoring functionality *For more details, please refer to the related links or feel free to contact us.

• Drying Equipment

The "MA-1000 series" is a manual exposure device suitable for small-lot production of various types and for experiments and research. It can adopt soft contact exposure and proximity exposure. Additionally, we prepare optical systems that combine ultra-high-pressure mercury lamps, various mirrors, and special lenses appropriately according to the application and substrate size. 【Features】 ■ Capable of soft contact exposure and proximity exposure ■ In-plane uniform illumination using a unique mirror and lens optical system ■ Multi-layer exposure is possible *For more details, please refer to the related links or feel free to contact us.

• Other processing machines

The "manual hot plate baking device" is a suitable product for experimental labs. By providing heat from the bottom of the substrate, the coating material and moisture on the top of the substrate are dried uniformly. It can be equipped with substrate support pins and a lift-up mechanism for substrate removal. Additionally, the surface of the hot plate is flat, so there is no unevenness caused by pins or similar items. Please feel free to contact us when you need assistance. 【Features】 ■ Compact size suitable for experiments and research ■ Flat surface of the hot plate prevents unevenness caused by pins and similar items ■ Can be equipped with substrate support pins and a lift-up mechanism for substrate removal *For more details, please refer to the related links or feel free to contact us.

• Heating device
• Drying Equipment

Please feel free to contact us when considering the stabilization of pure water supply. - Levitronix bearingless pump (magnetic levitation centrifugal pump) - It has low pulsation and stable supply performance. - Achieves low dust generation with a non-contact impeller. - It boasts maintenance-free operation and high durability. - Customization is possible to meet customer requirements.

• Other semiconductor manufacturing equipment

We have obtained a patent for a maintenance method for stone flat stages using lasers, which is attracting significant attention as a new surface processing method. Stone flat stages used in devices like die cutters develop a mirror-like surface with repeated use. When the surface becomes mirror-like, it can cause charge separation, leading to pattern damage due to static electricity and breakage of glass substrates due to sticking. Traditionally, various measures have been taken, such as "sanding," "applying anti-static agents," and "reducing peeling speed," but each of these has its own challenges. The laser polishing technology we propose addresses these issues and is gaining considerable attention as a new surface processing method. Since the surface is not ground down, the flatness of the stage remains unchanged, and there is no concern about the generation of grinding debris (particles). Furthermore, the working time can be significantly reduced compared to manual polishing. [Experience and Strengths] - We propose processing patterns that not only prevent static cling but also minimize coating unevenness. - Management of the customer's flat stage condition based on work records.

• Processing Contract

● Numerous delivery achievements to mass production factories ● We propose suitable etching equipment configurations such as spray treatment, dip treatment, and paddle treatment according to the application ● Improved uniformity with our uniquely developed spray nozzle ● Proven capability to handle various chemical solutions ● Substrate size: □100×100mm to □2,250×2,800mm 【Features】 ● Effective in reducing chemical consumption ● Achieves particle-free operation through a unique transport drive mechanism ● Enables registration of large processing data, accommodating diversification ● Reduces downtime with a status log function during alarm occurrences *For more details, please refer to the related links or feel free to contact us.*

• Plasma surface treatment equipment

This device can reliably remove bacteria in manufacturing lines that use pure water in clean rooms, contributing to improved yield and maintenance. By simultaneously utilizing ozone (O3) and ultraviolet (UV) photocatalysts, it decomposes bacteria and organic matter through advanced oxidation processes (AOP). Unlike chemical disinfection, it does not generate resistant bacteria. 【Features】 ■ Removes bacteria in a short time ■ Does not generate resistant bacteria ■ Removes biofilms due to powerful disinfection performance ■ No need for chemical cleaning during PM ■ No need for chemical purchase/recovery/device shutdown ■ By installing it on the downstream side of multiple circulating tanks, it also has an effect on the upstream tank.

• Other cleaning machines

Thanks to the unique design of SCREEN Fabex, which is part of our group, we boast high performance in temperature reproducibility and in-plane temperature uniformity. The firing unit, which is part of the coater developer series for the LCD market, is being expanded into other industries. From manual experimental machines to mass production machines, and from small to large work sizes, we propose suitable specifications. We manufacture equipment tailored to our customers' requests. 【Features】 ■ Space-saving ■ Low dust generation ■ High temperature reproducibility and in-plane temperature uniformity ■ Custom equipment manufacturing according to customer requests 【Specifications】 ■ Temperature performance: 0-200℃ ■ Temperature accuracy: ±3℃ at 150℃ ■ Work size: 4 to 12-inch wafers ■ Method: Hot plate method (substrate support: prokipin or lift pin)

• Other processing machines

Achieving three high-performance "Minimals"! "Minimal" Contamination The non-contact structure does not have components such as bearings, bushings, or opening and closing valves that can generate dust in the liquid-contact area. Therefore, there is no concern about contamination caused by the pump. Additionally, high-purity fluororesin, which has excellent chemical resistance, is used for the impeller and casing materials, eliminating worries about contamination. Structurally, the risk of contamination is minimized. "Minimal" Maintenance There are no sliding parts inside the pump, which means that there are no wear components that require maintenance. Furthermore, the impeller is driven by magnetic control, so there are no consumable parts typically required in conventional mechanical control. Due to these structural features, the frequency of maintenance is kept to a minimum. "Minimal" Pulsation and Vibration The impeller is rotated and liquid is delivered through magnetic control, resulting in no pulsation or vibration. Additionally, the absence of sliding parts ensures that there is no noise, providing a quiet environment. With high control performance at elevated speeds, precise flow delivery is achieved.

• CMP Equipment